Composite coating equipment of magnetron sputtering and cathodic multi-arc ion coating can work separately and simultaneously; can be deposited and prepared pure metal film, metal compound film or composite film; can be a single layer of film and a multi-layer composite film.
Its advantages as follow:
It not only combines the advantages of various ion coatings and takes into account the preparation and deposition of thin film for various fields of application, but also allows the deposition and preparation of multi-layer monolithic films or multi-layer composite films in the same vacuum coating chamber at one time.
The applications of deposited film layers are widely used its technologies are in a variety of forms , the typical ones as follow:
(1) The compound of non-equilibrium magnetron sputtering and cathodic ion plating technology.
Its device is shown as follow. It is a compound coating equipment of columnar magnetron target and planar cathodic arc ion coating, which is suitable for both tool coating compound film and decorative film coating. For tool coating, the cathodic arc ion coating is used first for the base layer coating, and then the column magnetron target is used for the deposition of nitride and other film layers to obtain a high-precision processing tool surface film.
For decorative coating, TiN and ZrN decorative films can be deposited by cathodic arc coating first, and then doped with metal using magnetron targets, and the doping effect is very good.
(2) The compound of twin plane magnetron and column cathode arc ion coating techniques. The device is shown as follow. It is used the advanced twin target technology, when two side-by-side twin targets linked to the medium frequency power supply, it not only overcomes the target poisoning of DC sputtering, fire and other drawbacks; and can deposit Al203, SiO2 oxide quality film, so that the oxidation resistance of the coated parts have increased and improved. Columnar multi-arc target installed in the center of the vacuum chamber, the target material can be used Ti and Zr, not only to maintain the advantages of high multi-arc dissociation rate, deposition rate, but also can effectively reduce " droplets " in the process of small plane multi-arc target deposition, can deposit and prepare a low porosity of metal films, compound films. If Al and Si are used as the target materials for the twin planar magnetron targets installed at the periphery, Al203 or Si0 metal-ceramic films can be deposited and prepared. In addition, multiple small planes of multi-arc evaporation source can be installed at the periphery, and its target material can be Cr or Ni, and metal films and multilayer composite films can be deposited and prepared. Therefore, this composite coating technology is a composite coating technology with multiple applications.
Post time: Nov-08-2022