Zvishandiso zvekufukidza zvakagadzirwa nemagnetron sputtering uye cathodic multi-arc ion coating zvinogona kushanda zvakasiyana uye panguva imwe chete; zvinogona kuiswa uye kugadzirwa firimu resimbi rakachena, firimu resimbi rakagadzirwa kana firimu rakagadzirwa; zvinogona kuva jira rimwe chete refirimu uye firimu rakagadzirwa ne multi-layer.
Zvakanakira zvayo ndeizvi:
Hazvingosanganisi chete zvakanakira ma ion coatings akasiyana-siyana uye zvinofunga nezvekugadzirira uye kuisa firimu rakatetepa munzvimbo dzakasiyana dzekushandisa, asiwo zvinobvumira kuisa uye kugadzira mafirimu akawanda-layer monolithic kana mafirimu akawanda-layer composite mukamuri rimwe chete re vacuum coating panguva imwe chete.
Mashandisirwo emafirimu akachengetwa anoshandiswa zvakanyanya, matekinoroji ayo ari mumhando dzakasiyana-siyana, ayo akajairika ndeaya anotevera:
(1) Musanganiswa we non-equilibrium magnetron sputtering uye cathodic ion plating technology.
Chishandiso chayo chinoratidzwa seizvi. Imidziyo yekufukidza yakasanganiswa yakagadzirwa ne columnar magnetron target uye planar cathodic arc ion coating, iyo yakakodzera tool coating compound film uye decoration film coating. Pakufukidza tool, cathodic arc ion coating inotanga yashandiswa pa base layer coating, uye column magnetron target inoshandiswa pakuisa nitride nedzimwe firimu layers kuti tool processing surface film iite nemazvo.
Pakushongedza, mafirimu ekushongedza eTiN neZrN anogona kuiswa ne cathodic arc coating kutanga, uye ozoiswa nesimbi uchishandisa magnetron targets, uye doping effect yakanaka kwazvo.
(2) Musanganiswa wemhando mbiri dzemagineti esimbi uye column cathode arc ion coating. Mudziyo uyu unoratidzwa seizvi. Unoshandiswa tekinoroji yepamusoro yemapatya maviri, apo matinji maviri esimbi akabatana ne medium frequency power supply, haungokundi chete chepfu yeDC sputtering, moto nezvimwe zvinokanganisa; uye unogona kuisa Al203, SiO2 oxide quality film, kuitira kuti oxidation resistance yezvikamu zvakaputirwa yawedzera uye yavandudzwa. Columnar multi-arc target yakaiswa pakati pe vacuum chamber, chinhu chinotarirwa chinogona kushandiswa Ti neZr, kwete chete kuchengetedza mabhenefiti e high-arc dissociation rate, deposition rate, asiwo inogona kuderedza zvinobudirira "drops" mukuita kwe small plane multi-arc target deposition, inogona kuisa uye kugadzirira porosity yakaderera yemafirimu esimbi, mafirimu esimbi. Kana Al neSi zvikashandiswa sezvinhu zvinotarirwa zvematinji maviri esimbi akaiswa pamucheto, mafirimu esimbi esimbi esimbi esimbi anogona kuiswa uye kugadzirwa. Pamusoro pezvo, mapuraneti madiki akawanda enzvimbo yekubuda kwemvura ine arc yakawanda anogona kuiswa pamucheto, uye zvinhu zvayo zvinogona kuva Cr kana Ni, uye mafirimu esimbi nemafirimu ane layer yakawanda anogona kuiswa uye kugadzirwa. Saka, iyi tekinoroji yekubatanidza coating tekinoroji yekubatanidza coating ine mashandisirwo akawanda.
Nguva yekutumira: Mbudzi-08-2022