Imishini yokuhlanganisa eyinhlanganisela ye-magnetron sputtering kanye ne-cathodic multi-arc ion coating ingasebenza ngokuhlukana nangesikhathi esisodwa; ingafakwa futhi ilungiswe ifilimu yensimbi ehlanzekile, ifilimu ehlanganisiwe yensimbi noma ifilimu eyinhlanganisela; kungaba ungqimba olulodwa lwefilimu kanye nefilimu enezingqimba eziningi.
Izinzuzo zayo kanje:
Ayihlanganisi nje kuphela izinzuzo zezinhlobonhlobo ze-ion ezinengilazi futhi icabangela ukulungiswa kanye nokubekwa kwefilimu encane emikhakheni ehlukahlukene yohlelo lokusebenza, kodwa futhi ivumela ukubekwa nokulungiswa kwamafilimu anezingqimba eziningi ze-monolithic noma amafilimu ahlanganisiwe anezingqimba eziningi ekamelweni elifanayo lokugqoka i-vacuum ngesikhathi esisodwa.
Izicelo zezendlalelo zefilimu ezifakiwe zisetshenziswa kakhulu ubuchwepheshe bayo bungezinhlobo ezahlukahlukene , ezijwayelekile ngale ndlela elandelayo:
(1) Inhlanganisela ye-non-equilibrium magnetron sputtering kanye nobuchwepheshe be-cathodic ion plating.
Idivayisi yayo iboniswa kanje. Kuyimishini yokuhlanganisa eyinhlanganisela yethagethi ye-columnar magnetron kanye ne-planar cathodic arc ion coating, efaneleka kokubili ifilimu ehlanganisa ithuluzi kanye nefilimu yokuhlobisa ifilimu. Ukuze kuhlanganiswe ithuluzi, i-cathodic arc ion coating isetshenziswa kuqala ungqimba lwesisekelo, bese ikholomu i-magnetron target isetshenziselwa ukubeka i-nitride nezinye izendlalelo zefilimu ukuze kutholwe ifilimu yangaphezulu yethuluzi lokucubungula ngokunemba okuphezulu.
Ukuze uthole ukuhlobisa okuhlobisa, amafilimu okuhlobisa i-TiN ne-ZrN angafakwa nge-cathodic arc coating kuqala, bese efakwa ngensimbi esebenzisa izinhloso ze-magnetron, futhi umphumela we-doping muhle kakhulu.
(2) Inhlanganisela ye-twin plane magnetron kanye nekholomu ye-cathode arc ion amasu okunamathela. Idivayisi ikhonjiswa kanje. Isetshenziswa ubuchwepheshe obuqondiswe ngamawele obuthuthukisiwe, lapho okuqondiwe okungamawele amabili kuxhunywe kugesi wefrikhwensi emaphakathi, ayinqobi kuphela ubuthi obuhlosiwe bokusputtering kwe-DC, umlilo nezinye izithiyo; futhi ingafaka ifilimu yekhwalithi ye-Al203, i-SiO2 oxide, ukuze ukumelana ne-oxidation kwezingxenye ezimboziwe kukhule futhi kuthuthuke. I-Columnar multi-arc target efakwe phakathi nendawo ye-vacuum chamber, into ehlosiwe ingasetshenziswa i-Ti ne-Zr, hhayi nje ukugcina izinzuzo eziphezulu ze-multi-arc dissociation rate, izinga lokubeka, kodwa futhi linganciphisa ngokuphumelelayo "amaconsi" ohlelweni lwendiza encane ye-arc target deposition, ingafaka futhi ilungiselele i-porosity ephansi yamafilimu ensimbi, amafilimu ensimbi. Uma i-Al ne-Si zisetshenziswa njengezinto eziqondiwe zamathagethi kamagnetron angamawele afakwe endaweni ezungezile, amafilimu e-Al203 noma i-Si0 metal-ceramic angafakwa futhi alungiswe. Ngaphezu kwalokho, izindiza ezincane eziningi zomthombo we-multi-arc evaporation zingafakwa ku-periphery, futhi impahla yayo ehlosiwe ingaba i-Cr noma i-Ni, futhi amafilimu ensimbi namafilimu enhlanganisela ye-multilayer angafakwa futhi alungiswe. Ngakho-ke, lobu buchwepheshe bokugqoka obuhlanganisiwe buwubuchwepheshe obuhlanganisiwe bokuhlanganisa nezinhlelo zokusebenza eziningi.
Isikhathi sokuthumela: Nov-08-2022