Izixhobo ezidibeneyo zokugquma i-magnetron sputtering kunye ne-cathodic multi-arc ion coating inokusebenza ngokwahlukileyo kwaye ngaxeshanye; inokufakwa kwaye ilungiswe ifilimu yesinyithi ecocekileyo, ifilimu edibeneyo yesinyithi okanye ifilimu edibeneyo; inokuba ngumaleko omnye wefilimu kunye nefilimu ehlanganisiweyo yamanqanaba amaninzi.
Iinzuzo zayo ngolu hlobo lulandelayo:
Ayidibanisi nje kuphela iingenelo ezahlukeneyo zokugquma kwe-ion kwaye ithathela ingqalelo ukulungiswa kunye nokubekwa kwefilimu ebhityileyo kwiinkalo ezahlukeneyo zesicelo, kodwa ikwavumela ukubekwa kunye nokulungiswa kweefilimu ze-monolithic ezinomaleko amaninzi okanye iifilimu ezihlanganisiweyo zomaleko kwigumbi elinye lokugquma i-vacuum ngexesha elinye.
Ukusetyenziswa kweemaleko zefilimu ezidiphozithiweyo zisetyenziswa ngokubanzi itekhnoloji yayo ikwiindlela ezahlukeneyo, eziqheleke ngolu hlobo lulandelayo:
(1) Ikhompawundi ye-non-equilibrium magnetron sputtering kunye ne-cathodic ion plating technology.
Isixhobo sayo siboniswe ngolu hlobo lulandelayo. Sisixhobo sokugquma sekhompiyutha ekujoliswe kuyo yi-columnar magnetron kunye neplani yecathodic arc ion coating, efanelekileyo kuzo zombini izixhobo zokugquma ifilimu kunye nefilimu yokuhombisa. Ukufakwa kwesixhobo, i-cathodic arc ion coating isetyenziswa kuqala kwi-coat layer yesiseko, kwaye ke i-target yekholamu ye-magnetron isetyenziselwa ukubekwa kwe-nitride kunye nezinye iileya zefilimu ukufumana ifilimu ephezulu yokucoca isixhobo somgangatho.
Ukugubungela ukuhlobisa, iifilimu zokuhlobisa i-TiN kunye ne-ZrN zinokufakwa kwi-cathodic arc coating kuqala, kwaye emva koko i-doped ngentsimbi isebenzisa iithagethi zemagnetron, kwaye umphumo we-doping ulungile kakhulu.
(2) Ikhompawundi yemagnetron yeplane kunye nekholamu yecathode arc ion ubuchule bokugquma. Isixhobo siboniswa ngolu hlobo lulandelayo. Isetyenziselwa iteknoloji yethagethi ephambili, xa iithagethi ezimbini zecala-by-icala ezidityaniswe kunikezelo lwamandla ombane ophakathi, ayikoyisi kuphela ityhefu ekujoliswe kuyo ye-DC sputtering, umlilo kunye nezinye iingxaki; kwaye ingafaka i-Al203, i-SiO2 ifilimu esemgangathweni ye-oxide, ukwenzela ukuba ukuxhathisa kwe-oxidation yeendawo ezigqunyiweyo ziye zanda kwaye ziphuculwe. I-columnar i-multi-arc target ifakwe kumbindi wegumbi lokucoca, into ekujoliswe kuyo ingasetyenziselwa i-Ti kunye ne-Zr, kungekhona nje ukugcina inzuzo yezinga eliphezulu lokuqhawula i-arc multi-arc, isantya sokubeka, kodwa inokunciphisa ngokufanelekileyo "amathontsi" kwinkqubo yokubeka i-arc encinci ye-arc target, ingafaka kwaye ilungiselele i-porosity ephantsi yeefilimu zetsimbi, iifilimu zesinyithi. Ukuba i-Al kunye ne-Si zisetyenziswa njengezinto ezijoliswe kuzo kwiithagethi ze-magnetron ezicwangcisiweyo ezifakwe kwi-periphery, i-Al203 okanye i-Si0 ifilimu ze-metal-ceramic zingafakwa kwaye zilungiswe. Ukongeza, iindiza ezincinci ezininzi zomthombo we-arc evaporation zingafakwa kwi-periphery, kwaye izinto ezijolise kuzo zingaba yi-Cr okanye i-Ni, kunye neefilimu zetsimbi kunye neefilimu ezihlanganisiweyo ezininzi zinokufakwa kwaye zilungiswe. Ngoko ke, le teknoloji yokudibanisa itekhnoloji yitekhnoloji yokwambathisa edibeneyo enezicelo ezininzi.
Ixesha lokuposa: Nov-08-2022