Cov khoom siv txheej txheej ntawm magnetron sputtering thiab cathodic multi-arc ion txheej tuaj yeem ua haujlwm sib cais thiab ib txhij; tuaj yeem tso thiab npaj cov yeeb yaj kiab hlau ntshiab, cov yeeb yaj kiab hlau sib xyaw lossis cov yeeb yaj kiab sib xyaw; tuaj yeem yog ib txheej ntawm zaj duab xis thiab ntau txheej txheej zaj duab xis.
Nws qhov zoo raws li hauv qab no:
Nws tsis tsuas yog muab cov txiaj ntsig zoo ntawm ntau yam ion txheej txheej thiab coj mus rau hauv tus account qhov kev npaj thiab kev tso tawm ntawm nyias zaj duab xis rau ntau daim ntawv thov, tab sis kuj tso cai rau kev tso tawm thiab kev npaj ntawm ntau txheej monolithic films lossis ntau txheej txheej zaj duab xis hauv tib lub tshuab nqus tsev txheej hauv ib lub sijhawm.
Cov ntawv thov ntawm cov txheej txheej zaj duab xis tau dav siv nws cov thev naus laus zis muaj ntau hom, cov qauv zoo li hauv qab no:
(1) Lub compound ntawm non-equilibrium magnetron sputtering thiab cathodic ion plating tshuab.
Nws cov cuab yeej yog qhia raws li nram no. Nws yog cov khoom siv txheej txheej ntawm columnar magnetron lub hom phiaj thiab cov phiaj xwm cathodic arc ion txheej, uas yog tsim rau ob qho tib si txheej txheej zaj duab xis thiab cov yeeb yaj kiab zoo nkauj. Rau cov cuab yeej txheej, cov txheej txheem cathodic arc ion yog siv ua ntej rau txheej txheej txheej, thiab tom qab ntawd lub hom phiaj ntawm kab hlau nplaum yog siv rau kev tso tawm ntawm nitride thiab lwm cov txheej txheej zaj duab xis kom tau txais cov cuab yeej ua haujlwm siab.
Rau cov txheej txheem zoo nkauj, TiN thiab ZrN cov yeeb yaj kiab zoo nkauj tuaj yeem tso los ntawm cathodic arc txheej ua ntej, thiab tom qab ntawd doped nrog hlau siv lub hom phiaj magnetron, thiab cov nyhuv doping zoo heev.
(2) Qhov sib xyaw ntawm ntxaib dav hlau magnetron thiab kem cathode arc ion txheej txheej txheem. Cov cuab yeej yog qhia raws li nram no. Nws yog siv lub tshuab ntxaib lub hom phiaj siab tshaj plaws, thaum ob lub hom phiaj ntxaib txuas nrog rau nruab nrab zaus fais fab mov, nws tsis tsuas yog kov yeej lub hom phiaj lom ntawm DC sputtering, hluav taws thiab lwm yam teeb meem; thiab tuaj yeem tso Al203, SiO2 oxide zoo zaj duab xis, kom cov oxidation tsis kam ntawm coated qhov chaw tau nce thiab txhim kho. Columnar multi-arc lub hom phiaj ntsia rau hauv nruab nrab ntawm lub tshuab nqus tsev chamber, lub hom phiaj cov khoom siv tau Ti thiab Zr, tsis yog tsuas yog los tswj qhov zoo ntawm ntau lub arc dissociation tus nqi, deposition npaum li cas, tab sis kuj muaj peev xwm txo tau "tej" nyob rau hauv cov txheej txheem ntawm me me dav hlau multi-arc phiaj deposition, muaj peev xwm deposit thiab npaj ib tug tsawg porosity ntawm hlau films, compound films. Yog tias Al thiab Si siv los ua cov khoom siv rau lub hom phiaj ntxaib lub hom phiaj magnetron ntsia rau ntawm qhov chaw, Al203 lossis Si0 hlau-ceramic films tuaj yeem tso thiab npaj. Tsis tas li ntawd, ntau lub dav hlau me me ntawm multi-arc evaporation qhov chaw tuaj yeem ntsia tau rau ntawm qhov chaw nruab nrab, thiab nws lub hom phiaj cov khoom tuaj yeem yog Cr lossis Ni, thiab cov yeeb yaj kiab hlau thiab cov yeeb yaj kiab sib xyaw ua ke tuaj yeem tso thiab npaj. Yog li ntawd, cov txheej txheem txheej txheej no yog cov txheej txheem sib xyaw nrog ntau yam kev siv.
Post lub sij hawm: Nov-08-2022