Ii-vacuum coatingInkqubo yomatshini yahlulwe yaba: i-vacuum evaporation coating, i-vacuum sputtering coating kunye ne-vacuum ion coating.
1, Umshini ngumphunga enamathelayo
Phantsi kwemeko ye-vacuum, yenza izinto zibe ngumphunga, ezifana nesinyithi, i-alloy yesinyithi, njl. uze uzibeke phezu komphezulu we-substrate, indlela yokugquma umphunga idla ngokusebenzisa ukufudumeza kokumelana, uze emva koko uqhushumbe umqadi we-electron wezinto zokugquma, uzenze zibe ngumphunga zibe yigesi, uze uzibeke phezu komphezulu we-substrate, ngokwembali, ukubekwa komphunga we-vacuum yiteknoloji yangaphambili esetyenziswa kwindlela ye-PVD.
2, Ukwaleka okutshizayo
Igesi ikhutshwa phantsi kweemeko zokukhupha umoya ezizaliswe yi-(Ar) Ngeli xesha ii-athomu ze-argon (Ar) ion zifakwa kwi-nitrogen ion (Ar), ii-ion zikhawuleziswa ngamandla ombane, kwaye ziqhumise ithagethi ye-cathode eyenziwe ngezinto zokugquma, ithagethi iya kutsalwa kwaye ibekwe kumphezulu we-substrate. Ii-ion zesiganeko kwi-sputter coating, ezifunyanwa ngokubanzi ngokutsalwa komoya, zikwi-10-2pa ukuya kwi-10Pa, ngoko ke ii-particles ezitsaliwe kulula ukungqubana nee-molecules zegesi kwigumbi le-vacuum xa zibhabha zisiya kwi-substrate, okwenza indlela yokuhamba ingacwangciswanga kwaye ifilimu ebekweyo ibe lula ukuba ifane.
3, Ion yokwaleka
Phantsi kweemeko ze-vacuum, Phantsi kwemeko ye-vacuum, Kusetyenziswe indlela ethile ye-plasma ionization ukuze kufakwe i-ion kwiiathom zezinto zokugquma zibe zii-ion. Kwangaxeshanye, kuveliswa iiathom ezininzi ezingathathi cala ezinamandla aphezulu, ezingathathi cala kwi-substrate. Ngale ndlela, ii-ion zifakwa kumphezulu we-substrate phantsi kwe-deep negative bias ukuze zenze ifilimu encinci.
Ixesha lokuthumela: Matshi-23-2023