Iukugquma kwevacuuminkqubo yomatshini yahlulwe ibe: vacuum evaporation ukutyabeka, vacuum sputtering ukutyabeka kunye vacuum ion ukutyabeka.
1. Ukugquma komphunga
Phantsi kwemeko vacuum, ukwenza izinto evaporated, ezifana intsimbi, ingxubevange yesinyithi, njl. Emva koko uwabeke phezu komhlaba substrate, indlela yokwaleka umphunga idla ngokusetyenziswa ukufudumeza ukumelana, kwaye ke electron umqadi bombardment yezinto ukutyabeka, wenze kubo. Ifakwe ngumphunga kwisigaba serhasi, emva koko idipozithi kumphezulu wesubstrate, ngokwembali, ukubekwa komphunga wevacuum bubuchwephesha bangaphambili obusetyenziswa kwindlela yePVD.
2. Ukugquma
Irhasi iphantsi kokukhutshwa okukhanyayo phantsi kweemeko zevacuum ezaliswe yi-argon (Ar) ngalo mzuzu i-argon (Ar) i-athom ion kwi-nitrogen ion (Ar), ii-ion zikhawuleziswa ngamandla ommandla wombane, kwaye zibhobhoze ithagethi yecathode ethi yenziwe ngezinto zokugquma, ekujoliswe kuyo kuya kugalelwa ngaphandle kwaye kufakwe kumphezulu we-substrate I-ion yesiganeko kwi-sputter coating, efunyanwa ngokubanzi ngokukhutshelwa okukhanyayo, kuluhlu lwe-10-2pa ukuya kwi-10Pa, Ngoko ke amasuntswana atshiziweyo kulula ukungqubana. kunye iimolekyuli zerhasi kwigumbi vacuum xa ibhabha ukuya substrate, ukwenza ulwalathiso intshukumo random kwaye ifilim efakwe lula ukuba iyunifomu.
3, Ion ukutyabeka
Phantsi kweemeko zokufutha, Phantsi kwemeko yokufunxa, Kusetyenziswe indlela ethile ye-ionisation yeplasma ukuze kufakwe i-athomu yezinto zokugquma zibe yi-ion. Ngaxeshanye ziveliswa ii-athom ezininzi eziphezulu zamandla angathathi hlangothi, ezithambekele kakubi kwi-substrate. zifakwe kumphezulu we-substrate phantsi kwe-bias embi enzulu ukwenza ifilimu encinci.
Ixesha lokuposa: Mar-23-2023