Thedahaarka faakuumkahabka mashiinka waxa loo qaybiyaa: vacuum uumi daahan, vacuum sputtering daahan iyo vacuum ion daahan.
1. vacuum daahan uumiga
Under xaaladda vacuum ah, ka dhigi walxaha uumi baxay, sida birta, daawaha biraha, iwm ka dibna iyaga ku shubi dusha substrate ah, habka daahan uumiga inta badan waxaa loo isticmaalaa kulaylka iska caabin ah, ka dibna bam elektarooniga ah ee alaabta daahan, ka dhigi uumi baxay galay wajiga gaaska, ka dibna ku shubi dusha sare ee substrate, taariikh ahaan, kaydinta uumiga vacuum waa tignoolajiyada hore ee loo isticmaalo habka PVD.
2. dahaarka sputtering
Gaaska waxaa lagu soo shubaa dareere dhalaal ah oo hoos yimaada xaaladaha faakuumka (Ar) oo buuxsamay Waqtigan xaadirka ah argon (Ar) atomamka ion ee ion nitrogen (Ar), ion-yada waxaa lagu dedejiyaa xoogga beerta, waxayna duqeeyaan bartilmaameedka cathode Waxay ka samaysan tahay walxaha dahaarka ah, bartilmaameedka waa la soo daadin doonaa oo lagu kaydin doonaa dusha sare ee substrate Iions Dhacdada ku jirta daahan sputter, guud ahaan lagu helo dheecaan dhalaalaya, waxay ku jiraan inta u dhaxaysa 10-2pa ilaa 10Pa oo leh unugyada gaaska ee qolka faakuumka marka ay u duulayaan dhinaca substrate-ka, taas oo ka dhigaysa jihada dhaqdhaqaaqa si aan kala sooc lahayn iyo filimka la dhigay mid sahlan oo labbis ah.
3, daahan ion
Under xaaladaha vacuum ah, Under xaalad vacuum ah, loo isticmaalo farsamo ionisation Plasma gaar ah si qayb ahaan ionise atamka walxaha daahan galay ion. Isla mar ahaantaana badan oo tamarta sare atamka dhexdhexaad ah ayaa la soo saaray, kuwaas oo si xun u eexan on substrate ah. waxaa lagu shubaa dusha sare ee substrate ka hooseeya eex qoto dheer oo taban si loo sameeyo filim khafiif ah.
Waqtiga boostada: Mar-23-2023