Ihemkpuchi ihe mkpofuA na-ekewa usoro igwe n'ime: mkpuchi ikuku evaporation, mkpuchi oghere sputtering na mkpuchi ion ikuku.
1, mkpuchi ikuku evaporation
N'okpuru ọnọdụ ikuku, mee ka ihe ahụ gbapụ, dịka ígwè, ihe eji eme ihe, wdg. wee tinye ha n'elu ihe eji eme ihe, usoro mkpuchi ikuku na-ejikarị ikpo ọkụ na-eguzogide, wee jiri ihe eji eme ihe mkpuchi mee ihe, mee ka ha gbapụ n'ime usoro gas, wee tinye ha n'elu ihe eji eme ihe, n'akụkọ ihe mere eme, ihe eji eme ihe ikuku ikuku bụ teknụzụ mbụ eji eme ihe na usoro PVD.
2, mkpuchi sputtering
A na-etinye gas ahụ n'okpuru ọnọdụ ikuku jupụtara na (Ar). Ugbu a, a na-eme ka atọm argon (Ar) banye na ion nitrogen (Ar), ike nke ubi eletriki na-eme ka ion ndị ahụ dị ngwa ngwa, ma na-atụba ihe mgbaru ọsọ cathode nke ejiri ihe mkpuchi mee, a ga-awụpụ ihe mgbaru ọsọ ahụ ma tinye ya n'elu elu ihe mkpuchi ahụ. ion ndị a na-eme na mkpuchi sputter, nke a na-enwetakarị site na mgbapụta ọkụ, dị n'etiti 10-2pa ruo 10Pa. Ya mere, ihe ndị a na-agbapụta dị mfe ịkpọkọta na molekul gas dị n'ime ụlọ vacuum mgbe ha na-efega na substrate, na-eme ka ntụziaka mmegharị ahụ dị mfe ma ihe nkiri echekwara dị mfe ịdị otu.
3, mkpuchi ion
N'okpuru ọnọdụ ikuku, N'okpuru ọnọdụ ikuku, ejiri usoro ionization plasma ụfọdụ mee ka atọm ihe mkpuchi ahụ bụrụ ion n'ime ion. N'otu oge ahụ, a na-emepụta ọtụtụ atọm na-anọpụ iche nke nwere ike dị elu, nke na-adịghị mma na substrate ahụ. N'ụzọ dị otu a, a na-etinye ion n'elu substrate ahụ n'okpuru nnukwu echiche ọjọọ iji mepụta ihe nkiri dị gịrịgịrị.
Oge ozi: Maachị-23-2023