Thedahaarka faakuumkahabka mashiinka waxa loo qaybiyaa: vacuum uumi daahan, vacuum sputtering daahan iyo vacuum ion daahan.
1. vacuum daahan uumiga
Under xaaladda vacuum ah, ka dhigi walxaha uumi baxay, sida birta, daawaha birta, iwm ka dibna iyaga ku shub dusha substrate ah, habka daahan uumiga waxaa inta badan la isticmaalo kululaynta iska caabin ah, ka dibna bam elektarooniga ah ee walxaha daahan, iyaga ka dhigi uumi galay wajiga gaaska, ka dibna dhigaal dusha substrate ah, taariikh ahaan, vacuum uumiga PVD dhigaysa technology hore loo isticmaalo.
2. dahaarka sputtering
Gaaska waxaa lagu sakhiray dareere dhalaal ah oo hoos yimaada xaaladaha faakuumka (Ar) oo buuxsamay Waqtigan xaadirka ah argon (Ar) atamka ion galay nitrogen ions (Ar), ion-yada waxaa lagu dedejiyaa xoogga beerta korontada, oo duqeeya bartilmaameedka cathode kaas oo ka samaysan walxaha daahan, bartilmaameedka ayaa la firdhi doonaa oo lagu kaydin doonaa dusha sare ee substrate Dhacdooyinka, guud ahaan daahan laga helay spu 10-2pa illaa 10Pa
3, daahan ion
Under xaaladaha vacuum ah, Under xaalad vacuum ah, loo isticmaalo farsamo ionisation plasma gaar ah si qayb ahaan ionise atamka walxaha daahan galay ion. Isla mar ahaantaana tamar badan oo tamarta sare atamka dhexdhexaad ah ayaa la soo saaray, kuwaas oo si xun u eexan on substrate. Sidan, ions waxaa lagu kaydiyaa on substrate ka hooseeya eexasho qoto dheer negative si ay u sameeyaan filim khafiif ah.
Waqtiga boostada: Mar-23-2023