Ukugeleza Kwenqubo Yomshini Wokumboza Okugcotshwayo

1. Isisekelo sokuhlanza amabhomu

1.1) Umshini wokumboza osebenzisa ukukhishwa kokukhanya ukuhlanza i-substrate. Okusho ukuthi, shaja igesi ye-argon ekamelweni, i-voltage yokukhipha igesi icishe ibe yi-1000V, Ngemva kokuvula ugesi, kukhiqizwa ukukhishwa kokukhanya, bese i-substrate ihlanzwa nge-argon ion bombardment.

1.2) Emishinini yokumboza ekhipha imihlobiso esezingeni eliphezulu ezimbonini, ama-ion e-titanium akhishwa yimithombo emincane ye-arc asetshenziswa kakhulu ekuhlanzeni. Umshini wokumboza okhipha imihlobiso ufakwe umthombo omncane we-arc, kanti umfudlana we-ion ye-titanium ku-plasma ye-arc okhiqizwa ukuphuma komthombo omncane we-arc usetshenziselwa ukuhlasela nokuhlanza i-substrate.

2. Ukugqoka kwe-titanium nitride

Uma kufakwa amafilimu amancane e-titanium nitride, izinto eziqondiwe zokufaka i-sputtering yi-titanium target. Izinto eziqondiwe zixhunywe ku-electrode engemihle yokunikezwa kwamandla okufaka i-sputtering, futhi i-voltage eqondiwe ingu-400~500V; I-argon flux izinzile, kanti i-control vacuum ingu-(3~8) x10^-1I-PA. I-substrate ixhunywe ku-electrode engemihle yokunikezwa kwamandla kwe-bias, ene-voltage engu-100 ~ 200V.

Ngemva kokuvula ukunikezwa kwamandla kwethagethi ye-titanium eqhumayo, kukhiqizwa ukukhishwa kokukhanya, bese ama-ion e-argon anamandla aphezulu ehlasela ithagethi eqhumayo, eqhuma ama-athomu e-titanium esuka kuthagethi.

I-nitrogen yegesi yokusabela iyethulwa, bese ama-athomu e-titanium kanye ne-nitrogen kufakwa i-ion ibe ama-ion e-titanium kanye nama-ion e-nitrogen ekamelweni lokumboza. Ngaphansi kokukhangwa yinsimu kagesi engathandeki esetshenziswa ku-substrate, ama-ion e-titanium kanye nama-ion e-nitrogen ashesha aye ebusweni be-substrate ukuze kuphendulwe ngamakhemikhali futhi kufakwe ungqimba lwefilimu ye-titanium nitride.

3. Khipha i-substrate

Ngemva kokufinyelela ubukhulu befilimu obubekiwe, cisha ugesi ogelezayo, ugesi ohambisana ne-substrate, kanye nomthombo womoya. Ngemva kokuba izinga lokushisa le-substrate liphansi kune-120 ℃, gcwalisa igumbi lokumboza ngomoya bese ukhipha i-substrate.

Lesi sihloko sishicilelwe nguumenzi womshini wokumboza we-magnetron sputtering– Guangdong Zhenhua.