Tsarin kwararar na'urar shafa Sputtering

1. Tsaftace bama-bamai

1.1) Injin shafawa na sputtering yana amfani da hasken rana don tsaftace substrate. Wato, cajin iskar argon zuwa cikin ɗakin, ƙarfin fitarwa yana kusa da 1000V. Bayan kunna wutar lantarki, ana samar da hasken rana, kuma ana tsaftace substrate ɗin ta hanyar amfani da bam ɗin argon ion.

1.2) A cikin injunan rufewa na sputtering waɗanda ke samar da kayan ado masu inganci a masana'antu, ana amfani da ions na titanium da ƙananan hanyoyin baka ke fitarwa galibi don tsaftacewa. Injin rufewa na sputtering yana da ƙaramin tushen baka, kuma ana amfani da kwararar ion na titanium a cikin plasma na arc da ƙaramin tushen baka ke samarwa don yin ruwan sama da tsaftace substrate.

2. Rufin nitride na titanium

Lokacin da ake ajiye siraran fim ɗin titanium nitride, kayan da ake nufi da sputtering shine abin da ake nufi da titanium. An haɗa kayan da ake nufi da electrode mara kyau na wutar lantarki mai sputtering, kuma ƙarfin wutar lantarki mai niyya shine 400~500V; an gyara iskar argon, kuma injin sarrafa iska shine (3~8) x10^-1PA. An haɗa substrate ɗin da electrode mara kyau na wutar lantarki mai bias, tare da ƙarfin lantarki na 100 ~ 200V.

Bayan kunna wutar lantarki ta hanyar amfani da titanium mai zubewa, ana fitar da wani haske, kuma ions na argon masu ƙarfi suna jefa bom a kan abin da ake nufi da sputtering, suna fitar da ƙwayoyin titanium daga abin da ake nufi.

Ana shigar da iskar gas ta nitrogen, sannan a mayar da atom ɗin titanium da nitrogen zuwa ions ɗin titanium da ions ɗin nitrogen a cikin ɗakin rufewa. A ƙarƙashin jan hankalin filin lantarki na rashin son zuciya da aka sanya wa substrate, ions ɗin titanium da ions ɗin nitrogen suna hanzarta zuwa saman substrate don amsawar sinadarai da kuma adanawa don samar da layin fim na titanium nitride.

3. Cire substrate ɗin

Bayan kauri fim ɗin da aka ƙayyade, kashe wutar lantarki mai fitar da iska, wutar lantarki mai son kai ta substrate, da kuma tushen iska. Bayan zafin substrate ya yi ƙasa da 120 ℃, cika ɗakin murfin da iska sannan a cire substrate ɗin.

An buga wannan labarin ta hanyarna'urar samar da shafi mai amfani da magnetron sputtering- Guangdong Zhenhua.