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Tsari Gudawar Injin Rufaffen Ruwa

Tushen labarin: Zhenhua vacuum
Karanta:10
An buga:23-04-07

1. Bombardment tsaftacewa substrate

1.1) Sputtering shafi inji amfani da haske fitarwa don tsaftace substrate.Wato cajin gas ɗin argon a cikin ɗakin, ƙarfin wutar lantarki yana kusa da 1000V, Bayan kunna wutar lantarki, ana samun fitarwa mai haske, kuma ana tsabtace substrate ta hanyar bam ɗin argon ion.

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1.2) A cikin injunan suturar sputtering waɗanda masana'antu ke samar da manyan kayan ado na ƙarshe, ion titanium da ke fitar da ƙananan maɓuɓɓugar baka ana amfani da su don tsaftacewa.Na'ura mai watsawa ta sputtering tana sanye take da ƙaramin tushen baka, kuma ana amfani da rafin titanium ion a cikin arc plasma da aka samar ta hanyar ƙaramar fitowar arc don yin bombard da tsaftace substrate.

2. Titanium nitride shafi

Lokacin ajiye fina-finai na titanium nitride na bakin ciki, abin da aka yi niyya don sputtering shine manufa ta titanium.Abubuwan da aka yi niyya an haɗa su da wutar lantarki mara kyau na samar da wutar lantarki, kuma maƙasudin ƙarfin lantarki shine 400 ~ 500V;An gyara jujjuyawar argon, kuma injin sarrafawa shine (3 ~ 8) x10-1PAThe substrate an haɗa zuwa korau electrode na bias ikon samar, tare da wani irin ƙarfin lantarki na 100 ~ 200V.

Bayan kunna wutar lantarki na maƙasudin titanium sputtering, an samar da wani haske mai haske, kuma argon ions masu ƙarfi masu ƙarfi sun yi bama-bamai da manufa, suna sputtering titanium atoms daga abin da aka nufa.

An gabatar da iskar iskar iskar gas, kuma ana yin ionized titanium atom da nitrogen a cikin ion titanium da ions nitrogen a cikin ɗakin shafi.Karkashin jan hankalin filin lantarki mara kyau da aka yi amfani da shi zuwa ga substrate, ions titanium da ions nitrogen suna hanzarta zuwa saman ƙasa don ɗaukar sinadarai da sanyawa don samar da Layer fim na titanium nitride.

3. Cire substrate

Bayan kai kaurin fim ɗin da aka riga aka ƙaddara, kashe wutar lantarki mai watsawa, samar da wutar lantarki mai ƙima, da tushen iska.Bayan substrate zafin jiki ne kasa da 120 ℃, cika shafi jam'iyyar da iska da kuma fitar da substrate.

An buga wannan labarinmagnetron sputtering shafi inji manufacturer- Guangdong Zhenhua.


Lokacin aikawa: Afrilu-07-2023