Ukwambathisa i-ionumatshini yavela kwithiyori eyacetywayo nguDM Mattox ngeminyaka yoo-1960, kwaye iimvavanyo ezifanayo zaqala ngelo xesha; Kude kube ngu-1971, uChambers nabanye bapapasha itekhnoloji ye-electron beam ion plating; Itekhnoloji ye-reactive evaporation plating (ARE) yachazwa kwingxelo kaBunshah ngo-1972, xa kwaveliswa iintlobo zeefilimu ezinzima kakhulu ezifana neTiC kunye neTiN; Kwakhona ngo-1972, uSmith noMolley bamkela itekhnoloji ye-hollow cathode kwinkqubo yokugquma. Ngeminyaka yoo-1980, i-ion plating eTshayina ekugqibeleni yayifikelele kwinqanaba lokusetyenziswa kwemizi-mveliso, kwaye iinkqubo zokugquma ezifana ne-vacuum multi-arc ion plating kunye ne-arc-discharge ion plating zazivele ngokulandelelana.
Yonke inkqubo yokusebenza kwe-vacuum ion plating yile ilandelayo: okokuqala,impompoigumbi lokucoca ulwelo, uze emva kokoyimauxinzelelo lwe-vacuum ukuya kwi-4X10 ⁻ ³ Paokanye ngcono, kuyimfuneko ukudibanisa umbane ophezulu we-voltage kwaye wakhe indawo yeplasma eshushu ephantsi yegesi yokukhupha i-voltage ephantsi phakathi kwe-substrate kunye ne-evaporator. Qhagamshela i-electrode ye-substrate nge-voltage ephezulu ye-5000V DC negative ukuze kwenziwe i-glow discharge ye-cathode. Ii-ion zegesi ezingenayo ziyaveliswa kufutshane nendawo yokukhanya engalunganga. Zingena kwindawo emnyama ye-cathode kwaye zikhawuleziswa yintsimi yombane kwaye ziqhumise umphezulu we-substrate. Le yinkqubo yokucoca, kwaye emva koko zingene kwinkqubo yokugquma. Ngesiphumo sokufudumeza kwe-bombardment, ezinye izinto zokugquma ziyavuthwa. Indawo yeplasma ingena kwiiproton, ingqubana nee-electron kunye nee-ion zegesi ezingenayo, kwaye inxalenye encinci yazo i-ionized, Ezi ioni ze-ionized ezinamandla aphezulu ziya kuhlasela umphezulu wefilimu kwaye ziphucule umgangatho wefilimu ukuya kwinqanaba elithile.
Umgaqo wokufaka i-ion ye-vacuum ngulo: kwigumbi le-vacuum, kusetyenziswa i-gas discharge phenomenon okanye inxalenye ye-ionized yezinto eziphefumulayo, phantsi kokuqhushumba kwee-ion zezinto eziphefumulayo okanye ii-ion zegesi, ngaxeshanye zifaka ezi zinto ziphefumulayo okanye ii-reactants zazo kwi-substrate ukuze zenze ifilimu encinci. I-ion coatingumatshiniIdibanisa i-vacuum evaporation, iteknoloji ye-plasma kunye nokukhutshwa kwegesi, okungaphuculi nje kuphela umgangatho wefilimu, kodwa kwandise uluhlu lokusetyenziswa kwefilimu. Iingenelo zale nkqubo kukuphambuka okunamandla, ukunamathela okuhle kwefilimu, kunye nezixhobo ezahlukeneyo zokugquma. Umgaqo we-ion plating wacetywa okokuqala nguDM Mattox. Kukho iintlobo ezininzi ze-ion plating. Uhlobo oluqhelekileyo kukufudumeza umphunga, kubandakanya ukufudumeza ukumelana, ukufudumeza i-electron beam, ukufudumeza i-plasma electron beam, ukufudumeza i-high-frequency induction kunye nezinye iindlela zokufudumeza.
Ixesha lokuthumela: Februwari-14-2023