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Lub hauv paus ntsiab lus ua haujlwm ntawm Ion Plating tshuab yog dab tsi?

Tsab xov xwm qhov chaw: Zhenhua lub tshuab nqus tsev
Nyeem: 10
Luam tawm: 23-02-14

Txheej iontshuab tau pib los ntawm txoj kev xav uas DM Mattox tau hais tawm hauv xyoo 1960, thiab cov kev sim sib xws tau pib thaum lub sijhawm ntawd; Txog xyoo 1971, Chambers thiab lwm tus tau tshaj tawm cov thev naus laus zis ntawm electron beam ion plating; Cov thev naus laus zis reactive evaporation plating (ARE) tau taw qhia hauv daim ntawv qhia Bunshah hauv xyoo 1972, thaum cov yeeb yaj kiab super-hard xws li TiC thiab TiN tau tsim tawm; Tsis tas li ntawd hauv xyoo 1972, Smith thiab Molley tau siv cov thev naus laus zis cathode hollow hauv cov txheej txheem txheej. Los ntawm xyoo 1980, ion plating hauv Suav teb thaum kawg tau mus txog qib kev siv hauv kev lag luam, thiab cov txheej txheem txheej txheem xws li vacuum multi-arc ion plating thiab arc-discharge ion plating tau tshwm sim ua ntu zus.

Cov duab 20230214085805

Tag nrho cov txheej txheem ua haujlwm ntawm lub tshuab nqus tsev ion plating yog raws li nram no: thawj,twj tso kua mislub tshuab nqus tsev vacuum, thiab tom qab ntawdtoslub tshuab nqus tsev siab rau 4X10 ⁻ ³ Palos yog zoo dua, nws yog qhov tsim nyog los txuas lub zog hluav taws xob siab thiab tsim kom muaj thaj chaw plasma kub qis ntawm cov roj tso tawm qis ntawm lub substrate thiab lub evaporator. Txuas lub substrate electrode nrog 5000V DC qhov hluav taws xob siab tsis zoo los tsim kom muaj kev tso tawm ntawm cathode. Cov roj ions inert raug tsim nyob ze ntawm thaj chaw ci tsis zoo. Lawv nkag mus rau thaj chaw tsaus ntuj cathode thiab raug nrawm los ntawm lub teb hluav taws xob thiab foob pob rau ntawm qhov chaw ntawm lub substrate. Qhov no yog cov txheej txheem ntxuav, thiab tom qab ntawd nkag mus rau cov txheej txheem txheej. Los ntawm cov nyhuv ntawm kev foob pob cua sov, qee cov ntaub ntawv plating raug vaporized. Thaj chaw plasma nkag mus rau protons, sib tsoo nrog electrons thiab cov roj ions inert, thiab ib feem me me ntawm lawv yog ionized, Cov ions ionized no nrog lub zog siab yuav foob pob rau ntawm qhov chaw zaj duab xis thiab txhim kho qhov zoo ntawm zaj duab xis rau qee qhov.

 

Lub hauv paus ntsiab lus ntawm lub tshuab nqus tsev ion plating yog: hauv lub tshuab nqus tsev, siv cov pa roj tawm lossis cov ionized ntawm cov khoom siv vaporized, nyob rau hauv lub foob pob ntawm cov khoom siv vaporized ions lossis cov roj ions, tib lub sijhawm tso cov tshuaj vaporized no lossis lawv cov reactants rau ntawm lub substrate kom tau txais ib zaj duab xis nyias. Lub txheej iontshuabua ke cov tshuab nqus tsev evaporation, plasma technology thiab gas glow discharge, uas tsis yog tsuas yog txhim kho qhov zoo ntawm zaj duab xis xwb, tab sis kuj nthuav dav ntau yam kev siv ntawm zaj duab xis. Qhov zoo ntawm cov txheej txheem no yog diffraction muaj zog, zaj duab xis lo zoo, thiab ntau yam khoom siv txheej. Lub hauv paus ntsiab lus ntawm ion plating tau thawj zaug los ntawm DM Mattox. Muaj ntau hom ion plating. Hom feem ntau yog evaporation cua sov, suav nrog kev tiv thaiv cua sov, electron beam cua sov, plasma electron beam cua sov, high-frequency induction cua sov thiab lwm yam kev cua sov.


Lub sijhawm tshaj tawm: Lub Ob Hlis-14-2023