Kodi mfundo yogwirira ntchito ya makina opangira ma ion ndi iti?

Chophimba cha ayonimakina Chiyambi cha chiphunzitso chomwe chinaperekedwa ndi DM Mattox m'zaka za m'ma 1960, ndipo zoyeserera zofananazo zinayamba panthawiyo; Mpaka 1971, Chambers ndi ena adasindikiza ukadaulo wa electron beam ion plating; Ukadaulo wa reactive evaporation plating (ARE) unafotokozedwa mu lipoti la Bunshah mu 1972, pomwe mitundu ya mafilimu olimba kwambiri monga TiC ndi TiN idapangidwa; Komanso mu 1972, Smith ndi Molley adagwiritsa ntchito ukadaulo wa hollow cathode mu njira yophimba. Pofika m'ma 1980, ion plating ku China potsiriza idafika pamlingo wogwiritsidwa ntchito m'mafakitale, ndipo njira zophimba monga vacuum multi-arc ion plating ndi arc-discharge ion plating zidawonekera motsatizana.

Njira yonse yogwirira ntchito yopangira ma ion a vacuum ndi iyi: choyamba,pompachipinda chotsukiramo vacuum, kenakodikiranikuthamanga kwa vacuum kufika pa 4X10 ⁻ ³ Pakapena bwino, ndikofunikira kulumikiza mphamvu yamagetsi yamagetsi okwera ndikumanga dera lotentha la plasma la mpweya wotsika wotulutsa mphamvu yamagetsi otsika pakati pa substrate ndi evaporator. Lumikizani electrode ya substrate ndi 5000V DC negative high voltage kuti mupange kuwala kotulutsa kwa cathode. Ma ioni a mpweya wopanda mphamvu amapangidwa pafupi ndi dera lowala lopanda mphamvu. Amalowa m'dera lamdima la cathode ndipo amafulumizitsidwa ndi mphamvu yamagetsi ndikuphulitsa pamwamba pa substrate. Iyi ndi njira yoyeretsera, kenako amalowa mu njira yophikira. Kudzera mu mphamvu ya kutentha kwa bombardment, zinthu zina zophikira zimasanduka nthunzi. Dera la plasma limalowa m'ma proton, limagundana ndi ma elekitironi ndi ma ioni a mpweya wopanda mphamvu, ndipo gawo laling'ono la iwo limasinthidwa kukhala ioni. Ma ioni awa a ionized okhala ndi mphamvu yayikulu adzaphulitsa pamwamba pa filimu ndikukweza khalidwe la filimu mpaka pamlingo wina.

Mfundo ya vacuum ion plating ndi iyi: mu chipinda chopanda mpweya, pogwiritsa ntchito mpweya wotuluka kapena gawo la ion la zinthu zopatulidwa, pansi pa bombardment ya ma ions kapena ma ions a gasi opatulidwa, nthawi yomweyo amaika zinthu zopatulidwa kapena ma reactants awo pa substrate kuti apange filimu yopyapyala.makinaZimaphatikiza kusungunuka kwa vacuum, ukadaulo wa plasma ndi kutulutsa kwa gasi, zomwe sizimangowonjezera khalidwe la filimuyi, komanso zimakulitsa kuchuluka kwa ntchito ya filimuyi. Ubwino wa njirayi ndi kufalikira kwamphamvu, kumamatira bwino kwa filimu, ndi zipangizo zosiyanasiyana zokutira. Mfundo ya ion plating idaperekedwa koyamba ndi DM Mattox. Pali mitundu yambiri ya ion plating. Mtundu wodziwika kwambiri ndi kusungunuka kwa evaporation, kuphatikizapo kutenthetsa kolimba, kutentha kwa electron beam, kutentha kwa plasma electron beam, kutentha kwa high-frequency induction ndi njira zina zotenthetsera.