Okwu Mkpuchi ITO

Indium tin oxide (Indium Tin Oxide, nke a na-akpọ ITO) bụ oghere band sara mbara, ihe n-ụdị semiconductor nke nwere nnukwu doped, nwere nnukwu nnyefe ìhè a na-ahụ anya na obere njirimara resistive, ma si otú a na-eji ya eme ihe n'ọtụtụ sel anyanwụ, ngosipụta panel dị larịị, windo electrochromic, inorganic na organic thin-film electroluminescence, laser diode na ultraviolet detectors na ngwaọrụ photovoltaic ndị ọzọ, wdg. E nwere ọtụtụ ụzọ esi kwadebe ihe nkiri ITO, gụnyere pulsed laser deposition, sputtering, chemical vapor decomposition, spray thermal decomposition, sol-gel, evaporation, wdg. N'ime usoro evaporation, nke a na-ejikarị bụ electron beam evaporation.

E nwere ọtụtụ ụzọ isi kwadebe ihe nkiri ITO, gụnyere ntinye laser pulsed, sputtering, chemical vapor deposition, spray pyrolysis, sol-gel, evaporation na ndị ọzọ, nke usoro evaporation a na-ejikarị bụ evaporation electron beam. Nkwadebe evaporation nke ihe nkiri ITO na-enwekarị ụzọ abụọ: otu bụ iji ihe dị ọcha dị elu In, Sn alloy dị ka ihe isi mmalite, na ikuku oxygen maka evaporation mmeghachi omume; nke abụọ bụ iji ngwakọta dị ọcha dị elu In2O3:, SnO2 dị ka ihe isi mmalite maka evaporation kpọmkwem. Iji mee ihe nkiri ahụ nwere nnukwu transmittance na obere resistivity, na-achọkarị okpomọkụ dị elu ma ọ bụ mkpa maka emechi ihe nkiri ahụ ọzọ. HR Fallah et al. jiri usoro evaporation elektrọn beam na obere okpomọkụ iji tinye ihe nkiri dị gịrịgịrị ITO, iji mụọ mmetụta nke ọnụego edebe ihe, okpomọkụ annealing na paramita usoro ndị ọzọ na nhazi nke ihe nkiri ahụ, ihe onwunwe eletriki na anya. Ha kwuru na ibelata ọnụego edebe ihe nwere ike ime ka transmittance dịkwuo elu ma belata resistivity nke ihe nkiri ndị a na-eto obere okpomọkụ. Mgbasa nke ìhè a na-ahụ anya karịrị 92%, iguzogide ya bụkwa 7X10-4Ωcm. Ha gbanyere ihe nkiri ITO a kụrụ n'okpomọkụ ụlọ na 350~550℃, ha chọpụtakwara na ka okpomọkụ a na-ahụ anya dị elu, otú ahụ ka ihe nkiri ITO si ka mma. Mgbasa ìhè a na-ahụ anya nke ihe nkiri ndị ahụ mgbe a gbasasịrị ya na 550℃ bụ 93%, nha ọka dịkwa ihe dị ka 37nm. Usoro enyere aka na plasma nwekwara ike ibelata okpomọkụ substrate n'oge mmepụta ihe nkiri, nke bụ ihe kachasị mkpa na nhazi nke ihe nkiri ahụ, kristal bụkwa ihe kachasị mkpa. Usoro enyere aka na plasma nwekwara ike ibelata okpomọkụ substrate n'oge mmepụta ihe nkiri, ihe nkiri ITO nke e nwetara site na ntinye ahụ nwekwara arụmọrụ dị mma. iguzogide nke ihe nkiri ITO nke S. Laux et al. kwadoro. dị obere nke ukwuu, 5*10-”Ωcm, nnabata nke ìhè na 550nm erughị 5%, a na-agbanwekwa iguzogide ihe nkiri ahụ na bandwidth anya site na ịgbanwe nrụgide oxygen n'oge a na-etinye ya.

–E bipụtara akụkọ a site n'aka onyeigwe mkpuchi igwe emeputa ihe mkpuchiGuangdong Zhenhua