Ion txheejtshuab keeb kwm los ntawm txoj kev xav tau los ntawm DM Mattox hauv xyoo 1960, thiab cov kev sim sib txuas tau pib thaum lub sijhawm ntawd; Txog xyoo 1971, Chambers thiab lwm tus tau luam tawm cov thev naus laus zis ntawm electron beam ion plating; Lub tshuab reactive evaporation plating (ARE) thev naus laus zis tau taw qhia hauv Bunshah tsab ntawv ceeb toom xyoo 1972, thaum cov yeeb yaj kiab super-nyuaj xws li TiC thiab TiN tau tsim; Tsis tas li ntawd xyoo 1972, Smith thiab Molley tau txais kev siv tshuab hollow cathode hauv txheej txheej txheej. Los ntawm xyoo 1980s, ion plating hauv Suav teb tau kawg mus txog qib kev lag luam, thiab cov txheej txheem txheej xws li lub tshuab nqus tsev ntau arc ion plating thiab arc-discharge ion plating tau tshwm sim.
Tag nrho cov txheej txheem ua haujlwm ntawm lub tshuab nqus tsev ion plating yog raws li hauv qab no: ua ntej,twjlub tshuab nqus tsev vacuum, thiab tom qab ntawdtosLub tshuab nqus tsev siab rau 4X10 ⁻ ³ Palos yog zoo dua, nws yog ib qho tsim nyog los txuas cov hluav taws xob hluav taws xob siab thiab tsim kom muaj qhov kub thiab txias plasma cheeb tsam ntawm cov pa tawm hluav taws xob tsawg ntawm cov substrate thiab cov evaporator. Txuas lub substrate electrode nrog 5000V DC tsis zoo high voltage los tsim lub ci tawm ntawm lub cathode. Inert gas ions yog tsim nyob ze ntawm qhov chaw tsis zoo glow. Lawv nkag mus rau hauv qhov chaw tsaus nti cathode thiab nrawm nrawm los ntawm hluav taws xob teb thiab foob pob rau saum npoo ntawm substrate. Qhov no yog txheej txheem ntxuav, thiab tom qab ntawd nkag mus rau txheej txheej txheej. Los ntawm cov nyhuv ntawm cov cua kub cua sov, qee cov ntaub ntawv plating yog vaporized. Lub plasma cheeb tsam nkag mus rau hauv cov protons, sib tsoo nrog electrons thiab inert gas ions, thiab ib feem me me ntawm lawv yog ionized, Cov ionized ions nrog lub zog siab yuav bombard cov zaj duab xis nto thiab txhim kho cov zaj duab xis zoo rau qee yam.
Lub hauv paus ntsiab lus ntawm lub tshuab nqus tsev ion plating yog: nyob rau hauv lub tshuab nqus tsev chamber, siv cov pa paug tshwm sim los yog ionized ib feem ntawm cov khoom vaporized, nyob rau hauv lub bombardment ntawm cov khoom vaporized ions los yog roj ions, ib txhij tso cov vaporized tshuaj los yog lawv reactants ntawm lub substrate kom tau ib tug nyias zaj duab xis. Ion txheejtshuabcombines lub tshuab nqus tsev vacuum, plasma technology thiab roj glow paug, uas tsis tsuas yog txhim kho cov yeeb yaj kiab zoo, tab sis kuj nthuav dav daim ntawv thov ntau yam ntawm zaj duab xis. Qhov zoo ntawm cov txheej txheem no yog muaj zog diffraction, zoo zaj duab xis adhesion, thiab ntau yam ntaub ntawv txheej. Lub hauv paus ntsiab lus ntawm ion plating yog thawj zaug los ntawm DM Mattox. Muaj ntau hom ion plating. Feem ntau hom yog evaporation cua sov, nrog rau cov cua kub tsis kam, hluav taws xob hluav taws xob hluav taws xob cua sov, plasma electron beam cua sov, high-frequency induction cua sov thiab lwm yam cua sov txoj kev.
Post lub sij hawm: Feb-14-2023