Ma e jiri ya tụnyere teknụzụ mkpuchi ndị ọzọ, a na-eji njirimara ndị a mara mkpuchi magnetron sputtering: paramita ọrụ nwere nnukwu mgbanwe mgbanwe nke ọsọ ntinye mkpuchi na ọkpụrụkpụ (ọnọdụ nke mpaghara mkpuchi) enwere ike ijikwa ya ngwa ngwa, enweghịkwa mmachi imewe na geometry nke ihe mgbaru ọsọ magnetron iji hụ na mkpuchi ahụ dị n'otu; enweghị nsogbu nke ihe ntapu mmiri na oyi akwa ihe nkiri ahụ; enwere ike ime ihe fọrọ nke nta ka ọ bụrụ ọla niile, alloys, na seramiiki ka ọ bụrụ ihe ebumnuche; enwere ike ịmepụta ihe ebumnuche site na DC ma ọ bụ RF magnetron sputtering, nke nwere ike imepụta mkpuchi metal dị ọcha ma ọ bụ alloy nwere oke ziri ezi, yana ihe nkiri reactive metal nwere òkè gas. Site na sputtering DC ma ọ bụ RF, ọ ga-ekwe omume ịmepụta mkpuchi metal dị ọcha ma ọ bụ alloy nwere oke ziri ezi na nke na-adịgide adịgide, yana ihe nkiri reactive metal nwere òkè gas, iji mezuo ihe achọrọ nke ụdị ihe nkiri dị gịrịgịrị na oke ziri ezi. Paramita usoro nkịtị maka mkpuchi sputtering magnetron bụ: nrụgide ọrụ nke 0.1Pa; voltaji ebumnuche nke 300~700V; njupụta ike ebumnuche nke 1~36W/cm².
Ihe ndị dị mkpa nke ntụgharị magnetron bụ:
(1) Oke ọnụego nchekwa. N'ihi ojiji nke magnetron electrodes, enwere ike nweta nnukwu ọkụ ion bombardment target, yabụ ọnụego mgbawa sputter na elu ebumnuche na ọnụego itinye ihe nkiri na elu substrate dị oke elu.
(2) Ike dị elu. Ohere nke nkpọkọ nke elektrọn dị ala na atọm gas dị elu, yabụ ọnụego nkewa gas na-abawanye nke ukwuu. N'ihi ya, a na-ebelata ike nke gas mwepụta (ma ọ bụ plasma) nke ukwuu. Ya mere, a na-ebelata nrụgide magnetron DC ma e jiri ya tụnyere DC dipole sputtering, ọbụlagodi na a na-ebelata nrụgide ọrụ site na 1 ~ 10Pa ruo 10-210-1Pa sputtering voltaji na-ebelatakwa site na puku kwuru puku volts ruo ọtụtụ narị volts, arụmọrụ sputtering na ọnụego itinye ego na-abawanye site na usoro nke oke.
–E bipụtara akụkọ a site n'aka onyeigwe mkpuchi igwe emeputa ihe mkpuchiGuangdong Zhenhua
Oge ozi: Disemba-01-2023