Nā hiʻohiʻona o ka uhi ʻana i ka magnetron sputtering Mokuna 1

Ke hoʻohālikelike ʻia me nā ʻenehana uhi ʻē aʻe, ʻike ʻia ka uhi ʻana o ka magnetron sputtering e nā hiʻohiʻona aʻe: ʻo nā ʻāpana hana he nui ka nui o ka hoʻololi ʻana o ka wikiwiki o ka deposition coating a me ka mānoanoa (ke kūlana o ka wahi i uhi ʻia) hiki ke maʻalahi, a ʻaʻohe palena hoʻolālā i ka geometry o ka pahu magnetron e hōʻoia i ka kūlike o ka uhi; ʻaʻohe pilikia o nā ʻāpana droplet i ka papa kiʻiʻoniʻoni; ʻaneʻane hiki ke hana ʻia nā metala a pau, nā ʻāpana, a me nā seramika i mau mea i hoʻopaʻa ʻia; a hiki ke hana ʻia ka mea i hoʻopaʻa ʻia e DC a i ʻole RF magnetron sputtering, hiki ke hoʻohua i ka metala maʻemaʻe a i ʻole nā ​​mea hoʻohuihui me ka ratio pololei, a me nā kiʻiʻoniʻoni metala me ke komo kinoea. Ma o DC a i ʻole RF sputtering, hiki ke hoʻohua i nā metala maʻemaʻe a i ʻole nā ​​​​mea hoʻoheheʻe ʻia me nā ratio pololei a mau, a me nā kiʻi ʻoniʻoni metala me ke komo ʻana i ke kinoea, e hoʻokō i nā koi o ka ʻokoʻa kiʻiʻoniʻoni lahilahi a me ka pololei kiʻekiʻe. ʻO nā ʻāpana kaʻina hana maʻamau no ka uhi ʻana i ka magnetron sputtering ʻo: ke kaomi hana o 0.1Pa; manaʻo voliota o 300 ~ 700V; ka nui o ka mana o 1~36W/cm².

ʻO nā hiʻohiʻona kūikawā o ka magnetron sputtering:

(1) Ka nui o ka waiho ʻana. Ma muli o ka hoʻohana ʻana i nā electrodes magnetron, hiki ke kiʻi ʻia kahi pahu pahu pahu pahu nui loa, no laila ke kiʻekiʻe loa ke kiʻekiʻe o ka sputter etching rate ma ka ʻili i hoʻopaʻa ʻia a me ke kiʻi ʻoniʻoni deposition ma ka substrate surface.

(2) Ka mana kiʻekiʻe. He kiʻekiʻe ke kuʻi ʻana o nā electrons haʻahaʻa haʻahaʻa a me nā ʻātoma kinoea, no laila ua hoʻonui nui ʻia ka helu dissociation kinoea. No laila, hoʻemi nui ʻia ka impedance o ke kinoea hoʻokuʻu (a i ʻole plasma). No laila, DC magnetron sputtering hoʻohālikelike ʻia me DC dipole sputtering, ʻoiai ke hoʻemi ʻia ke kaomi hana mai 1 ~ 10Pa a hiki i 10-210-1Pa e hoʻemi ʻia ka volts sputtering mai nā tausani volts a hiki i nā haneli volts, ua hoʻonui ʻia ka maikaʻi o ka sputtering a me ka helu deposition e nā kauoha o ka nui.

-Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini hoʻopaʻa haʻahaʻaGuangdong Zhenhua