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Inqubo Ye-Small Arc Source Ion Coating

Umthombo we-athikili:I-vacuum ye-Zhenhua
Funda:10
Kushicilelwe:23-06-01

Inqubo yokumboza i-ion yomthombo we-cathodic arc ngokuyisisekelo iyafana nobunye ubuchwepheshe bokumboza, futhi eminye imisebenzi efana nokufaka ama-workpieces kanye ne-vacuum ayisaphindaphindwa.

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1.I-Bombardment yokuhlanza ama-workpieces

Ngaphambi kokumboza, igesi ye-argon yethulwa ekamelweni lokumboza nge-vacuum ye-2 × 10-2Pa.

Vula i-pulse bias power supply, nomjikelezo womsebenzi ongu-20% kanye nokuchema kocezu lokusebenza okungu-800-1000V.

Lapho amandla e-arc evuliwe, kukhiqizwa ukukhishwa kokukhanya kwe-arc field ebandayo, okukhipha inani elikhulu le-electron yamanje kanye ne-titanium ion yamanje emthonjeni we-arc, okwenza i-plasma ephakeme kakhulu.I-titanium ion isheshisa umjovo wayo endaweni yokusebenza ngaphansi kwengcindezi engalungile yokuchema ephezulu esetshenziswa endaweni yokusebenza, ibhomu futhi ifafaze igesi esele kanye nezinto ezingcolisayo ezikhangiswe phezu kwendawo yokusebenza, nokuhlanza nokuhlanza ubuso bomsebenzi;Ngesikhathi esifanayo, igesi ye-chlorine ekamelweni lokumboza i-ionized ngama-electron, futhi ama-argon ions asheshisa ukuqhuma kwamabhomu kwendawo yokusebenza.

Ngakho-ke, umphumela wokuhlanza i-bombardment muhle.Cishe iminithi elingu-1 kuphela lokuhlanza ibhomu elingahlanza ucezu lokusebenza, olubizwa ngokuthi “i-arc bombardment enkulu”.Ngenxa yobuningi be-titanium ions, uma umthombo omncane we-arc usetshenziselwa ukubhomba nokuhlanza ucezu lokusebenza isikhathi eside, izinga lokushisa lomsebenzi livame ukushisa ngokweqile, futhi unqenqema lwamathuluzi lungase luthambile.Ekukhiqizeni okujwayelekile, imithombo emincane ye-arc ivulwa ngamunye ngamunye ukusuka phezulu kuye phansi, futhi umthombo ngamunye we-arc omncane unesikhathi sokuhlanza amabhomu cishe iminithi elingu-1.

(1) Ukumboza ungqimba olungezansi lwe-titanium

Ukuze kuthuthukiswe ukunamathela phakathi kwefilimu ne-substrate, ungqimba lwe-titanium substrate ehlanzekile ngokuvamile lumbozwa ngaphambi kokumboza i-titanium nitride.Lungisa izinga le-vacuum libe ngu-5 × 10-2-3 × 10-1Pa, lungisa i-voltage ye-workpiece bias ibe ngu-400-500V, futhi ulungise umjikelezo womsebenzi wokunikezwa kwamandla okuchema kwe-pulse ku-40% ~ 50%.Kusathunga imithombo emincane ye-arc ngayinye ukuze kukhiqizwe ukukhishwa kwe-arc field ebandayo.Ngenxa yokuncipha kwe-voltage ye-bias engalungile ye-workpiece, amandla e-titanium ion ayancipha.Ngemva kokufinyelela kucezu lokusebenza, umphumela wokuphalaza ungaphansi komphumela wokubeka, futhi ungqimba olushintshayo lwe-titanium luyakhiwa endaweni yokusebenza ukuze kuthuthukiswe amandla okubopha phakathi kongqimba lwefilimu eqinile ye-titanium nitride kanye ne-substrate.Le nqubo futhi inqubo yokushisa i-workpiece.Lapho ithagethi ye-titanium emsulwa ikhishwa, ukukhanya ku-plasma kuba luhlaza okwesibhakabhaka oku-azure.

1.Isitsha se-ammoniated ifilimu eqinile yokugqoka

Lungisa idigri ye-vacuum ibe ngu-3×10-1-5Pa, lungisa i-workpiece bias voltage ibe ngu-100-200V, futhi ulungise umjikelezo womsebenzi we-pulse bias power supply ibe ngu-70%~80%.Ngemva kokwethulwa kwe-nitrogen, i-titanium iyinhlanganisela yokusabela ne-arc discharge plasma ukuze ifake ifilimu eqinile ye-titanium nitride.Kuleli qophelo, ukukhanya kwe-plasma egunjini le-vacuum kubomvu kwe-cherry.Uma u-C2H2, O2, njll. ziyethulwa, i-TiCN, i-TiO2, njll. izingqimba zefilimu zingatholakala.

-Le ndatshana ikhishwe nguGuangdong Zhenhua, aumenzi womshini we-vacuum coating


Isikhathi sokuthumela: Jun-01-2023