Inqubo yokugqoka i-cathodic arc source ion coating ifana kakhulu nezinye ubuchwepheshe bokugqoka, futhi eminye imisebenzi efana nokufaka izinto zokusebenza kanye nokuhlanza nge-vacuum ayisaphindwa.
1. Ukuhlanzwa kwezingxenye zokusebenza ngamabhomu
Ngaphambi kokufaka i-coating, igesi ye-argon ifakwa ekamelweni lokumboza nge-vacuum engu-2 × 10-2Pa.
Vula ugesi we-pulse bias, ngomjikelezo womsebenzi ongu-20% kanye ne-workpiece bias engu-800-1000V.
Uma amandla e-arc evuliwe, kukhiqizwa ukukhishwa kokukhanya kwe-arc field arc okubandayo, okukhipha inani elikhulu lamanje le-electron kanye ne-titanium ion current kusuka emthonjeni we-arc, kwakha i-plasma enobuningi obukhulu. I-titanium ion isheshisa ukufakwa kwayo engxenyeni yokusebenza ngaphansi kwengcindezi ephezulu ye-bias engalungile esetshenziswa engxenyeni yokusebenza, iqhumisa futhi ichithe igesi esele kanye nokungcola okumuncwe ebusweni bendawo yokusebenza, futhi ihlanza futhi ihlanze ubuso bendawo yokusebenza; Ngesikhathi esifanayo, igesi ye-chlorine ekamelweni lokumboza ifakwa ama-ion ngama-electron, futhi ama-ion e-argon asheshisa ukuqhumisa kwendawo yokusebenza.
Ngakho-ke, umphumela wokuhlanza ibhomu ulungile. Cishe umzuzu owodwa kuphela wokuhlanza ibhomu ungahlanza i-workpiece, ebizwa ngokuthi “i-main arc bombardment”. Ngenxa yobuningi obukhulu bama-ion e-titanium, uma umthombo omncane we-arc usetshenziswa ukuhlanza i-workpiece isikhathi eside kakhulu, izinga lokushisa le-workpiece livame ukushisa kakhulu, futhi unqenqema lwamathuluzi lungase luthambe. Ekukhiqizeni okuvamile, imithombo emincane ye-arc ivulwa ngamunye ngamunye kusukela phezulu kuya phansi, futhi umthombo ngamunye omncane we-arc unesikhathi sokuhlanza ibhomu esingaba ngumzuzu owodwa.
（1）Ungqimba olungezansi lwe-titanium olumbozwayo
Ukuze kuthuthukiswe ukunamathelana phakathi kwefilimu kanye ne-substrate, ungqimba lwe-titanium substrate emsulwa luvame ukumbozwa ngaphambi kokumboza i-titanium nitride. Lungisa izinga le-vacuum libe ngu-5 × 10-2-3 × 10-1Pa, lungisa i-voltage ye-bias ye-workpiece ibe ngu-400-500V, bese ulungisa umjikelezo womsebenzi wokunikezwa kwamandla we-pulse bias ku-40% ~ 50%. Kusavutha imithombo emincane ye-arc ngayinye ngayinye ukuze kukhiqizwe ukukhishwa kwe-cold field arcing. Ngenxa yokwehla kwe-voltage ye-bias engalungile ye-workpiece, amandla ama-ion e-titanium ayancipha. Ngemva kokufinyelela ku-workpiece, umphumela wokuphalaza ungaphansi komphumela wokubekwa, futhi ungqimba lokuguquka kwe-titanium luyakhiwa ku-workpiece ukuze kuthuthukiswe amandla okubopha phakathi kwengqimba yefilimu eqinile ye-titanium nitride kanye ne-substrate. Le nqubo futhi iyinqubo yokushisa i-workpiece. Lapho ithagethi ye-titanium emsulwa ikhishwa, ukukhanya ku-plasma kuluhlaza okwesibhakabhaka okukhanyayo.
1.Isimbozo sefilimu eqinile yesitsha esine-ammoniated
Lungisa izinga le-vacuum libe ngu-3 × 10-1-5Pa, lungisa i-voltage ye-bias ye-workpiece ibe ngu-100-200V, bese ulungisa umjikelezo womsebenzi wokunikezwa kwamandla kwe-pulse bias kube ngu-70% ~ 80%. Ngemva kokwethulwa kwe-nitrogen, i-titanium iyi-combination reaction ne-arc discharge plasma ukuze ifake i-titanium nitride hard film. Kuleli qophelo, ukukhanya kwe-plasma ekamelweni le-vacuum kubomvu njenge-cherry. Uma i-C2H2, O2, njll. kwethulwa, i-TiCN, i-TiO2, njll. izingqimba zefilimu zingatholakala.
–Lesi sihloko sikhishwe yiGuangdong Zhenhua,umenzi womshini wokumboza nge-vacuum
Isikhathi sokuthunyelwe: Juni-01-2023