Cov txheej txheem ntawm cathodic arc source ion txheej yog qhov zoo ib yam li lwm cov txheej txheem txheej, thiab qee qhov kev ua haujlwm xws li kev teeb tsa cov khoom ua haujlwm thiab kev nqus tsev tsis rov ua dua.
1. Kev ntxuav cov khoom ua haujlwm los ntawm kev foob pob
Ua ntej txheej, cov roj argon raug coj mus rau hauv chav txheej nrog lub tshuab nqus tsev ntawm 2 × 10-2Pa.
Qhib lub zog fais fab ntawm lub pulse bias, nrog lub voj voog ua haujlwm ntawm 20% thiab qhov ua haujlwm bias ntawm 800-1000V.
Thaum lub zog arc qhib, lub teeb arc txias tawm los, uas tso tawm ntau lub zog hluav taws xob thiab titanium ion tam sim no los ntawm qhov chaw arc, tsim cov plasma siab. Cov titanium ion txhaj tshuaj rau hauv cov khoom ua haujlwm sai dua nyob rau hauv lub siab tsis zoo siab siv rau cov khoom ua haujlwm, bombarding thiab sputtering cov roj seem thiab cov pa phem adsorbed rau ntawm qhov chaw ntawm cov khoom ua haujlwm, thiab ntxuav thiab ntxuav qhov chaw ntawm cov khoom ua haujlwm; Tib lub sijhawm, cov roj chlorine hauv lub chamber txheej yog ionized los ntawm electrons, thiab argon ions ua kom nrawm dua bombardment ntawm qhov chaw ua haujlwm.
Yog li ntawd, qhov kev ntxuav bombardment zoo heev. Tsuas yog li 1 feeb ntawm kev ntxuav bombardment tuaj yeem ntxuav cov khoom ua haujlwm, uas hu ua "main arc bombardment". Vim muaj cov titanium ions ntau, yog tias siv lub qhov me me arc los ntxuav cov khoom ua haujlwm ntev dhau, qhov kub ntawm cov khoom ua haujlwm yuav ua rau overheating, thiab ntug cuab yeej yuav mos. Hauv kev tsim khoom dav dav, cov qhov me me arc raug tig ib qho los ntawm sab saud mus rau hauv qab, thiab txhua qhov me me arc muaj lub sijhawm ntxuav bombardment li 1 feeb.
(1) Txheej titanium hauv qab
Yuav kom txhim kho qhov kev sib txuas ntawm zaj duab xis thiab cov substrate, ib txheej ntawm cov titanium substrate ntshiab feem ntau yog coated ua ntej txheej titanium nitride. Kho qhov theem nqus tsev rau 5 × 10-2-3 × 10-1Pa, kho qhov voltage ntawm workpiece bias rau 400-500V, thiab kho lub voj voog ua haujlwm ntawm lub zog pulse bias rau 40% ~ 50%. Tseem taws cov qhov chaw me me arc ib qho los ntawm ib qho los tsim cov cua txias arcing tawm. Vim yog qhov txo qis ntawm qhov voltage tsis zoo ntawm workpiece, lub zog ntawm titanium ions txo qis. Tom qab ncav cuag workpiece, qhov cuam tshuam sputtering tsawg dua li qhov cuam tshuam deposition, thiab ib txheej titanium hloov pauv yog tsim rau ntawm workpiece los txhim kho lub zog sib txuas ntawm titanium nitride zaj duab xis txheej thiab cov substrate. Cov txheej txheem no kuj yog cov txheej txheem ntawm kev ua kom sov workpiece. Thaum lub hom phiaj titanium ntshiab raug tso tawm, lub teeb hauv plasma yog azure xiav.
1. Cov txheej txheem tawv tawv ntawm lub tais ammoniated
Kho qhov degree nqus tsev kom txog 3 × 10-1-5Pa, kho qhov hluav taws xob ntawm qhov workpiece bias rau 100-200V, thiab kho lub voj voog ua haujlwm ntawm lub zog fais fab pulse bias rau 70% ~ 80%. Tom qab nitrogen nkag mus, titanium yog kev sib xyaw ua ke nrog cov plasma arc tawm kom tso titanium nitride zaj duab xis tawv. Thaum lub sijhawm no, lub teeb ntawm plasma hauv lub tshuab nqus tsev yog xim liab cherry. Yog tias C2H2, O2, thiab lwm yam tau qhia, TiCN, TiO2, thiab lwm yam. cov txheej zaj duab xis tuaj yeem tau txais.
– Tsab xov xwm no tau tshaj tawm los ntawm Guangdong Zhenhua, ib tuglub tshuab nqus tsev txheej tshuab chaw tsim khoom
Lub sijhawm tshaj tawm: Lub Rau Hli-01-2023