Inkqubo yokugquma i-cathodic arc source ion coating iyafana nezinye iiteknoloji zokugquma, kwaye eminye imisebenzi efana nokufaka izinto zokusebenza kunye nokutshiza nge-vacuum ayisaphindwa.
1. Ukucocwa kwezinto zokusebenza ngamabhombu
Ngaphambi kokufaka i-coating, i-argon gas ifakwa kwigumbi lokugubungela nge-vacuum ye-2 × 10-2Pa.
Vula umbane we-pulse bias, ngomjikelo womsebenzi we-20% kunye ne-workpiece bias ye-800-1000V.
Xa amandla e-arc evuliwe, kuveliswa ukukhutshwa kokukhanya kwe-arc field arc, okukhupha inani elikhulu le-electron current kunye ne-titanium ion current evela kumthombo we-arc, okwenza i-plasma enoxinano oluphezulu. I-titanium ion ikhawulezisa ukufakwa kwayo kwindawo yokusebenza phantsi koxinzelelo oluphezulu lwe-bias olubi olusetyenziswa kwindawo yokusebenza, iqhumisa kwaye itshize igesi eseleyo kunye nokungcola okufunxwa kumphezulu wendawo yokusebenza, kwaye icoce kwaye icoce umphezulu wendawo yokusebenza; Kwangaxeshanye, igesi ye-chlorine kwigumbi lokugquma ifakwa kwi-ion ngee-electron, kwaye ii-argon ion zikhawulezisa ukuqhushumba komphezulu wendawo yokusebenza.
Ngoko ke, isiphumo sokucoca ibhombardment silungile. Kuphela malunga nomzuzu omnye wokucoca ibhombardment onokucoca i-workpiece, ebizwa ngokuba yi-"main arc bombardment". Ngenxa yobunzima obukhulu bee-ion ze-titanium, ukuba umthombo omncinci we-arc usetyenziselwa ukuqhumisa nokucoca i-workpiece ixesha elide kakhulu, ubushushu be-workpiece bunokushushu kakhulu, kwaye umphetho wesixhobo unokuba thambile. Kwimveliso ngokubanzi, imithombo emincinci ye-arc ivulwa nganye nganye ukusuka phezulu ukuya ezantsi, kwaye umthombo ngamnye omncinci we-arc unexesha lokucoca ibhombardment elingangomzuzu omnye.
（1）Ukwaleka umaleko osezantsi we-titanium
Ukuze kuphuculwe ukunamathelana phakathi kwefilimu kunye ne-substrate, umaleko we-titanium substrate ecocekileyo uhlala ugqunywe ngaphambi kokuba ugqunywe i-titanium nitride. Lungisa inqanaba le-vacuum ukuya kwi-5 × 10-2-3 × 10-1Pa, lungisa i-voltage ye-bias ye-workpiece ukuya kwi-400-500V, kwaye ulungise umjikelo womsebenzi wombane we-pulse bias ukuya kwi-40% ~ 50%. Isatshisa imithombo emincinci ye-arc nganye nganye ukuvelisa i-cold field arcing discharge. Ngenxa yokwehla kwe-negative bias voltage ye-workpiece, amandla e-titanium ions ayancipha. Emva kokufikelela kwi-workpiece, isiphumo sokutshiza singaphantsi kwesiphumo sokubeka, kwaye umaleko wotshintsho lwe-titanium wenziwa kwi-workpiece ukuphucula amandla okubopha phakathi komaleko we-titanium nitride hard film kunye ne-substrate. Le nkqubo ikwayinkqubo yokufudumeza i-workpiece. Xa ithagethi ye-titanium ecocekileyo ikhutshwa, ukukhanya kwi-plasma kuluhlaza okwesibhakabhaka.
1. Isitya esine-ammoniated hard film coating
Lungisa i-vacuum degree ibe yi-3 × 10-1-5Pa, lungisa i-voltage ye-bias ye-workpiece ibe yi-100-200V, kwaye ulungise umjikelo womsebenzi wombane we-pulse bias ukuya kwi-70% ~ 80%. Emva kokuba i-nitrogen ingenisiwe, i-titanium yi-combination reaction kunye ne-arc discharge plasma ukufaka ifilimu eqinileyo ye-titanium nitride. Kule ndawo, ukukhanya kwe-plasma kwigumbi le-vacuum kubomvu njenge-cherry. Ukuba i-C2H2, O2, njl. ziyaziswa, iTiCN, iTiO2njl. iileya zefilimu zinokufunyanwa.
–Eli nqaku likhutshwe nguGuangdong Zhenhua,umenzi womatshini wokugquma nge-vacuum
Ixesha lokuthumela: Juni-01-2023