Maitiro eSmall Arc Source Ion Coating

Maitiro ekugadzira cathodic arc source ion coating akafanana nemamwe matekinoroji ekugadzira, uye mamwe mabasa akadai sekuisa maworkpieces uye vacuum cleaner haachadzokororwi.

1. Kucheneswa kwezvishandiso zvebasa nebhomba

Gasi reargon risati raiswa mukamuri rekuputira rine vacuum ye2×10-2Pa risati raiswa.

Batidza magetsi e "pulse bias", ne "duty cycle" ye20% uye "workpiece bias" ye800-1000V.

Kana simba re arc ravhurwa, chiedza che cold field arc chinobuda, chinoburitsa huwandu hwakawanda hwe electron current uye titanium ion current kubva ku arc source, zvichiita plasma ine density yakakura. Titanium ion inokurumidza kupinza kwayo mu workpiece pasi pe negative high bias pressure inoshandiswa pa workpiece, ichiputira uye ichidurura gasi rakasara uye tsvina yakanyungudutswa pamusoro pe workpiece, uye ichichenesa uye ichichenesa pamusoro pe workpiece; Panguva imwe chete, chlorine gasi iri mu coating chamber inoiswa ion nema electron, uye argon ions inokurumidza kuputira pamusoro pe workpiece.

Saka, kuchenesa kwebhombardment kwakanaka. Inenge miniti imwe chete yekuchenesa kwebhombardment ndiyo inogona kuchenesa workpiece, iyo inonzi "main arc bombardment". Nekuda kwehuwandu hwakawanda hwetitanium ions, kana tsime diki re arc rikashandiswa kuchenesa workpiece kwenguva yakareba, tembiricha ye workpiece inogona kupisa zvakanyanya, uye mupendero we tool unogona kunyorova. Mukugadzirwa kwakajairika, tsime diki re arc rinovhurwa rimwe nerimwe kubva kumusoro kusvika pasi, uye tsime rega rega re arc diki rine nguva yekuchenesa kwebhombardment yeinenge miniti imwe.

(1) Kufukidza titanium pasi pevhu

Kuti firimu ne substrate zvinake, jira retitanium substrate yakachena rinowanzo putirwa risati raputirwa titanium nitride. Gadzirisa vacuum level kusvika pa5×10-2-3×10-1Pa, gadzirisa workpiece bias voltage kusvika pa400-500V, uye gadzirisa duty cycle ye pulse bias power supply kusvika pa40%~50%. Tichiri kubatidza ma arc sources madiki rimwe nerimwe kuti tibudise cold field arcing discharge. Nekuda kwekudzikira kwe negative bias voltage ye workpiece, simba re titanium ions rinoderera. Mushure mekusvika pa workpiece, sputtering effect ishoma pane deposition effect, uye titanium transition layer inoumbwa pa workpiece kuti ivandudze bonding force pakati pe titanium nitride hard film layer ne substrate. Maitiro aya zvakare ndiwo maitiro ekupisa workpiece. Kana pure titanium target yaburitswa, chiedza chiri mu plasma chinopenya bhuruu.

1. Kuputira firimu rakaoma reAmmoniated ndiro

Gadzirisa dhigirii re vacuum kusvika pa 3 × 10^-1-5Pa, gadzirisa voltage ye workpiece bias kusvika pa100-200V, uye gadzirisa duty cycle ye pulse bias power supply kusvika pa70% ~ 80%. Mushure mekunge nitrogen yaiswa, titanium i combination reaction ne arc discharge plasma kuisa titanium nitride hard film. Panguva ino, chiedza che plasma mu vacuum chamber chatsvuka se cherry. Kana C₂H₂, O₂, nezvimwewo zvinounzwa, TiCN, TiO₂, nezvimwewo. Zvikamu zvemafirimu zvinogona kuwanikwa.

–Chinyorwa ichi chakaburitswa naGuangdong Zhenhua, mumwemugadziri wemuchina wevacuum coating