Inqubo yokumboza i-ion yomthombo we-cathodic arc ngokuyisisekelo iyafana nobunye ubuchwepheshe bokumboza, futhi eminye imisebenzi efana nokufaka ama-workpieces kanye ne-vacuum ayisaphindaphindwa.
1.I-Bombardment yokuhlanza ama-workpieces
Ngaphambi kokumboza, igesi ye-argon yethulwa ekamelweni lokumboza nge-vacuum ye-2 × 10-2Pa.
Vula ukunikezwa kwamandla kwe-pulse bias, ngomjikelezo wokusebenza ongu-20% kanye nokuchema kocezu lokusebenza okungu-800-1000V.
Lapho amandla e-arc evuliwe, kukhiqizwa ukukhishwa kokukhanya kwe-arc field ebandayo, okukhipha inani elikhulu le-electron yamanje kanye ne-titanium ion yamanje emthonjeni we-arc, okwenza i-plasma ephakeme kakhulu. Iyoni ye-titanium isheshisa umjovo wayo endaweni yokusebenza ngaphansi kwengcindezi engalungile yokuchema ephezulu esetshenziswa endaweni yokusebenza, ibhomu futhi ifafaze igesi esele kanye nezinto ezingcolisayo ezikhangiswe phezu kwendawo yokusebenza, nokuhlanza nokuhlanza ubuso bomsebenzi; Ngesikhathi esifanayo, igesi ye-chlorine ekamelweni lokumboza i-ionized ngama-electron, futhi ama-argon ions asheshisa ukuqhuma kwamabhomu kwendawo yokusebenza.
Ngakho-ke, umphumela wokuhlanza i-bombardment muhle. Cishe iminithi elingu-1 kuphela lokuhlanza ibhomu elingahlanza ucezu lokusebenza, olubizwa ngokuthi “i-arc bombardment enkulu”. Ngenxa yobuningi be-titanium ions, uma umthombo omncane we-arc usetshenziselwa ukubhomba nokuhlanza ucezu lokusebenza isikhathi eside, izinga lokushisa lomsebenzi livame ukushisa ngokweqile, futhi unqenqema lwamathuluzi lungase luthambile. Ekukhiqizeni okujwayelekile, imithombo emincane ye-arc ivulwa ngamunye ngamunye ukusuka phezulu kuye phansi, futhi umthombo ngamunye we-arc omncane unesikhathi sokuhlanza amabhomu cishe iminithi elingu-1.
(1) Ukumboza ungqimba olungezansi lwe-titanium
Ukuze kuthuthukiswe ukunamathela phakathi kwefilimu ne-substrate, ungqimba lwe-titanium substrate ehlanzekile ngokuvamile lumbozwa ngaphambi kokumboza i-titanium nitride. Lungisa izinga le-vacuum libe ngu-5 × 10-2-3 × 10-1Pa, lungisa i-voltage ye-workpiece bias ibe ngu-400-500V, futhi ulungise umjikelezo womsebenzi wokunikezwa kwamandla okuchema kwe-pulse ku-40% ~ 50%. Kusathunga imithombo emincane ye-arc ngayinye ukuze kukhiqizwe ukukhishwa kwe-arc field ebandayo. Ngenxa yokuncipha kwe-voltage ye-bias engalungile ye-workpiece, amandla e-titanium ion ayancipha. Ngemva kokufinyelela kucezu lokusebenza, umphumela wokuphalaza ungaphansi komphumela wokubeka, futhi ungqimba olushintshayo lwe-titanium luyakhiwa endaweni yokusebenza ukuze kuthuthukiswe amandla okubopha phakathi kongqimba lwefilimu eqinile ye-titanium nitride kanye ne-substrate. Le nqubo futhi inqubo yokushisa i-workpiece. Lapho ithagethi ye-titanium emsulwa ikhishwa, ukukhanya ku-plasma kuba luhlaza okwesibhakabhaka oku-azure.
1.Isitsha se-ammoniated ifilimu eqinile yokugqoka
Lungisa idigri ye-vacuum ibe ngu-3×10-1-5Pa, lungisa i-workpiece bias voltage ibe ngu-100-200V, futhi ulungise umjikelezo womsebenzi we-pulse bias power supply ibe ngu-70%~80%. Ngemva kokwethulwa kwe-nitrogen, i-titanium iyinhlanganisela yokusabela ne-arc discharge plasma ukuze ifake ifilimu eqinile ye-titanium nitride. Kuleli qophelo, ukukhanya kwe-plasma egunjini le-vacuum kubomvu kwe-cherry. Uma u-C2H2, O2, njll. ziyethulwa, i-TiCN, i-TiO2, njll. izingqimba zefilimu zingatholakala.
-Le ndatshana ikhishwe nguGuangdong Zhenhua, aumenzi womshini we-vacuum coating
Isikhathi sokuthumela: Jun-01-2023