Piv nrog rau lwm cov txheej txheem txheej txheej, sputtering txheej muaj cov yam ntxwv tseem ceeb hauv qab no: cov kev ua haujlwm tsis muaj qhov hloov pauv loj, cov txheej txheej txheej ceev thiab tuab (lub xeev ntawm cov txheej txheej) yog yooj yim los tswj, thiab tsis muaj kev txwv tsim ntawm cov geometry ntawm sputtering lub hom phiaj los xyuas kom meej lub uniformity ntawm txheej; Cov txheej txheej zaj duab xis tsis muaj teeb meem ntawm cov khoom me me: yuav luag tag nrho cov hlau, alloys thiab cov khoom siv ceramic tuaj yeem ua rau cov khoom siv; Los ntawm DC los yog RF sputtering, ntshiab hlau los yog alloy coatings nrog meej thiab tsis tu ncua proportions thiab hlau cov tshuaj tiv thaiv zaj duab xis nrog roj kev koom tes yuav raug generated kom tau raws li ntau haiv neeg thiab high-precision yuav tsum tau ntawm films. Cov txheej txheem tsis raug ntawm sputtering txheej yog: kev ua haujlwm siab yog 01Pa; Lub hom phiaj voltage yog 300 ~ 700V, thiab lub hom phiaj zog ceev yog 1 ~ 36W / cm2. Cov yam ntxwv tshwj xeeb ntawm sputtering yog:
(1) High deposition tus nqi. Vim yog siv cov electrodes, lub hom phiaj loj heev bombardment ion tam sim no tau txais, yog li qhov sputtering etching tus nqi ntawm lub hom phiaj nto thiab zaj duab xis deposition tus nqi ntawm lub substrate nto yog siab.
(2) Kev ua haujlwm siab zog. Qhov tshwm sim ntawm kev sib tsoo ntawm cov hluav taws xob qis hluav taws xob thiab cov roj atoms yog siab, yog li cov pa roj ionization tau nce siab heev. Ua ke, qhov impedance ntawm cov pa tawm (los yog plasma) txo qis heev. Yog li ntawd, piv nrog DC ob-ncej sputtering, txawm hais tias lub siab ua hauj lwm raug txo los ntawm 1 ~ 10Pa mus rau 10-2 ~ 10-1Pa, lub sputtering voltage yog txo los ntawm ob peb txhiab volts mus rau pua pua ntawm volts, thiab lub sputtering efficiency thiab deposition tus nqi nce los ntawm qhov kev txiav txim ntawm magnitude.
(3) Tsawg-zog sputtering. Vim tias qhov qis cathode voltage thov rau lub hom phiaj, cov ntshav yog khi rau hauv qhov chaw ze ntawm cathode los ntawm cov hlau nplaum, uas inhibits qhov tshwm sim ntawm cov khoom siv hluav taws xob siab rau sab ntawm lub substrate. Yog li ntawd, qhov degree ntawm kev puas tsuaj los ntawm kev foob pob ntawm cov khoom siv rau cov khoom siv hauv cov khoom siv semiconductor yog qis dua li ntawm lwm txoj hauv kev sputtering.
– Zaj lus no yog tso tawm los ntawmtshuab nqus tsev txheej tshuab manufacturersGuangdong Zhenhua.
Post lub sij hawm: Sep-08-2023