Nā hiʻohiʻona o ka magnetron sputtering coating mokuna 1

Ke hoʻohālikelike ʻia me nā ʻenehana uhi ʻē aʻe, loaʻa i ka sputtering coating nā hiʻohiʻona koʻikoʻi: ʻo nā ʻāpana hana i ka nui o ka hoʻololi hoʻololi ʻana, ʻo ka wikiwiki o ka deposition o ka uhi ʻana a me ka mānoanoa (ke kūlana o ka uhi ʻana) he maʻalahi ke kāohi, a ʻaʻohe mea hoʻolālā i ka geometry o ka sputtering target e hōʻoia i ka like o ka uhi; ʻAʻohe pilikia o ka papa kiʻiʻoniʻoni i nā ʻāpana droplet: aneane hiki ke hana ʻia nā metala āpau, nā ʻāpana a me nā mea seramika i mau mea i makemake ʻia; Ma ka DC a i ʻole RF sputtering, hiki ke hana ʻia nā metala maʻemaʻe a i ʻole nā ​​mea hoʻoheheʻe ʻia me nā ʻāpana kūpono a me nā kiʻi ʻoniʻoni metala me ke komo ʻana i ke kinoea e hoʻokō i nā koi ʻokoʻa a kiʻekiʻe o nā kiʻiʻoniʻoni. ʻO nā kaʻina hana maʻamau o ka uhi ʻana i ka sputtering: ʻo ke kaomi hana ʻo 01Pa; ʻO 300 ~ 700V ka volta i manaʻo ʻia, a ʻo 1 ~ 36W / cm2 ka nui o ka mana mana. ʻO nā ʻano kikoʻī o ka sputtering:

(1) Ka nui o ka waiho ʻana. Ma muli o ka hoʻohana ʻana i nā electrodes, hiki ke loaʻa i nā au ion bombardment target nui loa, no laila ua kiʻekiʻe ke kiʻekiʻe o ka sputtering etching rate ma ka ʻili i hoʻopaʻa ʻia a me ke kiʻiʻoniʻoni deposition rate ma ka substrate surface.

(2) Ka mana kiʻekiʻe. He kiʻekiʻe ka likelika o ka hui ʻana ma waena o nā electrons haʻahaʻa haʻahaʻa a me nā ʻātoma kinoea, no laila ua hoʻonui nui ʻia ka nui o ka ionization kinoea. ʻO ke kūpono, hoʻemi nui ʻia ka impedance o ke kinoea hoʻokuʻu (a i ʻole plasma). No laila, ke hoʻohālikelike ʻia me ka DC ʻelua-pole sputtering, ʻoiai inā e hoʻemi ʻia ke kaomi hana mai 1 ~ 10Pa a i 10-2 ~ 10-1Pa, ua hoʻemi ʻia ka volts sputtering mai kekahi mau tausani volts a hiki i nā haneli volts, a hoʻonui ka sputtering efficiency a me ka deposition rate ma nā kauoha o ka nui.

(3) Sputtering ikehu haʻahaʻa. Ma muli o ka haʻahaʻa cathode voltage i hoʻopili ʻia i ka pahu hopu, ua hoʻopaʻa ʻia ka plasma ma kahi kokoke i ka cathode e kahi māla magnetic, kahi e kāohi ai i ka ulu ʻana o nā ʻāpana kiʻekiʻe o ka ikehu i ka ʻaoʻao o ka substrate. No laila, ʻoi aku ka haʻahaʻa o ke kiʻekiʻe o ka pōʻino ma muli o ka pahū ʻana o nā ʻāpana i hoʻopiʻi ʻia i nā substrate e like me nā mea semiconductor ma mua o nā ʻano sputtering ʻē aʻe.

-Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini hoʻopaʻa haʻahaʻaGuangdong Zhenhua.