A. High sputtering rate. Semuyenzaniso, pakupuruzira SiO2, deposition rate inogona kusvika 200nm/min, kazhinji kusvika 10~100nm/min.
Uye chiyero chekugadzira firimu chakanyatsoenderana nepamusoro-soro simba.
B.Kunamira pakati pefirimu nesubstrate yakakura kudarika vacuum vapor deposition yefirimu layer. Izvi zvinokonzerwa nenheyo kumuviri wechiitiko cheatomu avhareji simba rekinetic rinenge 10eV, uye muplasma substrate ichaiswa pasi pekuchenesa kwakasimba kwe sputtering zvichikonzera kushoma pinholes mu membrane layer, kuchena kwepamusoro, dense membrane layer.
C.Wide kuchinjika kwezvinhu zve membrane, ingave simbi kana isiri-simbi kana makomisheni, zvinenge zvese zvigadzirwa zvinogona kugadzirirwa mundiro yakatenderedza, inogona kushandiswa kwenguva yakareba.
D.Zvinodiwa zvechimiro che substrate hazvisi kuda. Iyo isina kuenzana pamusoro peiyo substrate kana kuvepo kwediki slits nehupamhi isingasviki 1mm inogona zvakare kuputirwa mufirimu.
Kushandiswa kweredhiyo frequency sputtering coating Zvichienderana nehunhu huri pamusoro, iyo coating yakaiswa neredhiyo frequency sputtering parizvino iri kushandiswa zvakanyanya, kunyanya mukugadzirira kwemaseketi akabatanidzwa uye dielectric basa firimu rinonyanya kushandiswa zvakanyanya. Semuyenzaniso, zvisiri-conductor uye semiconductor zvinhu zvakaiswa neRF sputtering, zvinosanganisira zvinhu: semiconductor Si uye Ge, komputa zvinhu GsAs, GaSb, GaN, InSb, InN, AIN, CaSe, Cds, PbTe, yakakwirira-tembiricha semiconductors SiC, ferroelectric makomisheni B14O2O3O zvinhu B14O2O2Tification zvinhu. Al203, Y203, TiO2, ZiO2, SnO2, PtO, HfO2, Bi2O2, ZnO2, CdO, girazi, plastiki, nezvimwe.
Kana zvinangwa zvinoverengeka zvakaiswa mukamuri yekuputira, zvinokwanisika zvakare kupedzisa kugadzirira kweakawanda-layer firimu mukamuri imwechete pasina kuparadza vacuum panguva imwe. Yakatsaurirwa electrode redhiyo frequency mudziyo wekutakura zvindori zvemukati nekunze zvekugadzira disulfide coating muenzaniso wemidziyo inoshandiswa muredhiyo frequency source frequency ye11.36MHz, target voltage ye2 ~ 3kV, simba rese re12kW, kushanda kwesimba remagineti induction simba re0.008T, muganho we5.4 Paumum 6Pax1 vacuum. yakakwirira uye yakaderera deposition rate. Zvakare, iyo RF sputtering simba rekushandisa simba yakadzikira, uye huwandu hukuru hwesimba hunoshandurwa kuita kupisa, hunorasika kubva kumvura inotonhorera yechinangwa.
-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua
Nguva yekutumira: Zvita-21-2023