A. Yawan zubewa. Misali, lokacin sputtering SiO2, adadin ajiya na iya zama har zuwa 200nm/min, yawanci har zuwa 10 ~ 100nm/min.
Kuma adadin samar da fim ya yi daidai da ƙarfin mitar mai yawa.
B.Adhesion tsakanin fim da substrate ya fi girma da injin tururi jijiya na fim Layer. Wannan shi ne saboda tushe ga jikin abin da ya faru atom matsakaita kuzarin motsa jiki na kusan 10eV, kuma a cikin plasma substrate za a hõre m sputtering tsaftacewa sakamakon kasa pinholes a cikin membrane Layer, high tsarki, m membrane Layer.
C.Wide adaptability na membrane abu, ko dai karfe ko ba karfe ko mahadi, kusan duk kayan za a iya shirya a cikin wani zagaye farantin, za a iya amfani da dogon lokaci.
D. Abubuwan da ake buƙata don siffar substrate ba su da wuya. Hakanan za'a iya watsar da ƙasa mara daidaituwa na ƙasa ko kasancewar ƙananan slits tare da faɗin ƙasa da 1mm a cikin fim.
Aikace-aikacen murfin mitar rediyo dangane da halayen da ke sama, rufin da aka ajiye ta mitar rediyo a halin yanzu ana amfani da shi sosai, musamman a cikin shirye-shiryen haɗaɗɗun da'irori kuma ana amfani da fim ɗin aikin dielectric musamman. Alal misali, kayan da ba na sarrafawa da na'ura mai kwakwalwa da aka ajiye ta hanyar RF sputtering, ciki har da abubuwa: semiconductor Si da Ge, kayan haɗin GsAs, GaSb, GaN, InSb, InN, AIN, CaSe, Cds, PbTe, semiconductors masu zafi mai zafi SiC, ferroelectric mahadi B14T3O0, gass B14T3O0, Si2O2, gass B14T3O00, gass2. Y203, TiO2, ZiO2, SnO2, PtO, HfO2, Bi2O2, ZnO2, CdO, gilashin, filastik, da dai sauransu.
Idan an sanya maƙasudi da yawa a cikin ɗakin rufewa, kuma yana yiwuwa a kammala shirye-shiryen fim mai yawa a cikin ɗakin guda ɗaya ba tare da lalata injin a lokaci ɗaya ba. Na'urar mitar rediyo da aka keɓe don ɗaukar zobba na ciki da na waje don shirye-shiryen murfin disulfide misali ne na kayan aikin da ake amfani da su a cikin mitar mitar rediyo na 11.36MHz, ƙarfin wutar lantarki na 2 ~ 3kV, jimlar ikon 12kW, kewayon ƙarfin shigar da Magnetic na 0.008T, iyakacin vacuum-6. high and low deposition rate. Haka kuma, RF sputtering ikon yin amfani da ikon yana da ƙasa, kuma babban adadin wutar yana canzawa zuwa zafi, wanda ya ɓace daga ruwan sanyi na manufa.
–An fitar da wannan labarininjin shafa injin injinGuangdong Zhenhua
Lokacin aikawa: Dec-21-2023