Compared with evaporation plating and sputtering plating, the most important feature of ion plating is that the energetic ions bombard the substrate and the film layer while deposition takes place. The bombardment of charged ions produces a series of effects, mainly as follows.
① Membrane / base bonding force (adhesion) strong, the film layer is not easy to fall off due to ion bombardment of the substrate generated by the sputtering effect, so that the substrate is cleaned, activated and heated, not only to remove the adsorption of the gas on the surface of the substrate and the contaminated layer, but also to remove the surface of the substrate oxides. Ion bombardment of heating and defects can be caused by the enhanced diffusion effect of the substrate, both to improve the crystalline properties of the substrate surface layer organization, but also provides the conditions for the formation of alloy phases; and higher energy ion bombardment, but also produces a certain amount of ion implantation and ion beam mixing effect.
② Ion coating due to produce good bypassing radiation in the case of higher pressure (greater than or equal to 1Pa) is ionized vapor ions or molecules in its journey to the substrate before the gas molecules will encounter a number of collisions, so the film particles can be scattered around the substrate, thus improving the coverage of the film layer; and the ionized film particles will also be deposited under the action of the electric field on the surface of the substrate with negative voltage Any position on the surface of the substrate with negative voltage, which cannot be achieved by evaporation plating.
–This article is released by vacuum coating machine manufacturer Guangdong Zhenhua
Post time: Jan-12-2024