Xa kuthelekiswa ne-evaporation plating kunye ne-sputtering plating, uphawu olubaluleke kakhulu lwe-ion plating kukuba ii-ion ezinamandla zihlasela i-substrate kunye nomgangatho wefilimu ngelixa kusenzeka ukubekwa. Ukuqhushumba kwee-ion ezitshajiweyo kuvelisa uthotho lweziphumo, ikakhulu ngolu hlobo lulandelayo.
① Amandla okubopha i-membrane / isiseko (ukunamathela) aqinile, umaleko wefilimu akulula ukuwa ngenxa yokubhomba kwe-ion ye-substrate eveliswa yimpembelelo yokutshiza, ukuze i-substrate icocwe, isebenze kwaye ifudunyezwe, kungekuphela nje ukususa ukufunxwa kwegesi kumphezulu we-substrate kunye nomaleko ongcolisiweyo, kodwa nokususa umphezulu wee-oxides ze-substrate. Ukubhomba kwe-ion yokufudumeza kunye neziphene kunokubangelwa yimpembelelo ephuculweyo yokusasazeka kwe-substrate, zombini ukuphucula iipropati zekristale zombutho womaleko womphezulu we-substrate, kodwa ikwabonelela ngeemeko zokwenziwa kwezigaba ze-alloy; kunye nokubhomba kwe-ion enamandla aphezulu, kodwa ikwavelisa ubungakanani obuthile bokufakelwa kwe-ion kunye nempembelelo yokuxuba i-ion.
② I-ion coating ngenxa yokuvelisa i-radiation elungileyo yokudlula kwimeko yoxinzelelo oluphezulu (olungaphezulu okanye olulingana ne-1Pa) yi-ion yomphunga okanye iimolekyuli ezikwindlela yayo eya kwi-substrate ngaphambi kokuba iimolekyuli zegesi zihlangane neentlobo ngeentlobo zokungqubana, ngoko ke amasuntswana efilimu anokusasazwa ajikeleze i-substrate, ngaloo ndlela kuphuculwe ukugqunywa komaleko wefilimu; kwaye amasuntswana efilimu adibeneyo aya kufakwa phantsi kwesenzo sentsimi yombane kumphezulu we-substrate ene-voltage engalunganga. Nasiphi na isikhundla kumphezulu we-substrate esine-voltage engalunganga, esingenakufezekiswa ngokufaka umphunga.
–Eli nqaku likhutshwe nguumenzi womatshini wokugquma nge-vacuumGuangdong Zhenhua
Ixesha leposi: Jan-12-2024