Idan aka kwatanta da evaporation plating da sputtering plating, mafi mahimmancin fasalin ion plating shine cewa ions masu kuzari suna jefa bam a kan substrate da kuma fim ɗin Layer yayin da ake ajiyewa. Bom ɗin ions masu caji yana haifar da jerin tasirin, galibi kamar haka.
① Ƙarfin haɗin membrane / tushe (mannewa) mai ƙarfi, ba abu ne mai sauƙi a faɗuwa daga saman fim ɗin ba saboda fashewar ion na substrate da tasirin sputtering ya haifar, don haka an tsaftace substrate ɗin, an kunna shi kuma an dumama shi, ba wai kawai don cire shaƙar iskar gas a saman substrate da kuma gurɓataccen Layer ba, har ma don cire saman substrate oxides. Bombings na ion na dumama da lahani na iya faruwa ne ta hanyar ingantaccen tasirin yaɗuwar substrate, duka don inganta halayen kristal na tsarin saman substrate, amma kuma yana ba da yanayi don ƙirƙirar matakan ƙarfe; da kuma fashewar ion mai ƙarfi, amma kuma yana samar da wani adadin dasa ion da tasirin haɗa ion.
② Rufin ion wanda ke haifar da kyakkyawan radiation mai wucewa idan akwai matsin lamba mafi girma (fiye da ko daidai da 1Pa) shine ions na tururin ion ko ƙwayoyin halitta a cikin tafiyarsa zuwa substrate kafin ƙwayoyin iskar gas su haɗu da wasu karo-karo, don haka barbashin fim ɗin za a iya warwatse su kewaye substrate, don haka inganta murfin Layer na fim ɗin; kuma barbashin fim ɗin ionized za a kuma ajiye su a ƙarƙashin aikin filin lantarki a saman substrate tare da ƙarfin lantarki mara kyau. Duk wani matsayi a saman substrate tare da ƙarfin lantarki mara kyau, wanda ba za a iya cimma shi ta hanyar amfani da fenti mai ƙafewa ba.
– An fitar da wannan labarin ne dagainjin shafa injin injinGuangdong Zhenhua
Lokacin Saƙo: Janairu-12-2024