Ugereranije no gutwikira amazi n’ugutwikira amazi, ikintu cy’ingenzi cyane cyo gutwikira ayoni ni uko ayoni afite ingufu akubita substrate n’urutonde rwa filime mu gihe habayeho gutwikirwa. Gutwika ayoni afite ingufu bitanga ingaruka nyinshi, cyane cyane nk’izi zikurikira.
① Imbaraga zo gufatanya uturemangingo / fatizo (gufatana) zikomeye, urwego rwa filime ntirworoshye kugwa bitewe no guterwa kwa ion kuri substrate bivamo ingaruka zo guterwa, bityo substrate isukurwa, igakoreshwa kandi igashyuha, atari ukugira ngo ikureho gusa ukwinjira kwa gazi ku buso bwa substrate n'urwego rwanduye, ahubwo no kugira ngo ikureho ubuso bwa oxides za substrate. Kuterwa kwa ion mu gushyushya no kwangirika bishobora guterwa n'ingaruka nziza zo gukwirakwira kwa substrate, haba mu rwego rwo kunoza imiterere ya crystalline y'imiterere y'urwego rwa substrate, ariko kandi bitanga uburyo bwo gushyiraho ibyiciro bya alloy; hamwe no guterwa kwa ion mu ngufu nyinshi, ariko kandi bitanga ingano runaka ya ion iterwa kandi igahuza ion beam.
② Ingufu za iyoni ziterwa no gutanga imirasire myiza yo kunyura mu gihe hari umuvuduko mwinshi (uri hejuru cyangwa ungana na 1Pa) ni ions cyangwa molekile z’umwuka za iyoni cyangwa molekile mu rugendo rwazo rugana kuri substrate mbere yuko molekile za gaze zihura n’ibibazo byinshi, bityo uduce twa filime dushobora gukwirakwira hirya no hino kuri substrate, bityo bikanoza uburyo urwego rwa filime rutwikiriye; kandi uduce twa filime twa iyoni tuzashyirwa munsi y’imikorere y’amashanyarazi ku buso bwa substrate hamwe na voltage negative. Ahantu hose ku buso bwa substrate hamwe na voltage negative, bitagerwaho hakoreshejwe evaporation plating.
–Iyi nkuru yasohotse nauruganda rukora imashini zikora imashini zikoresha umwuka ushyushyeGuangdong Zhenhua
Igihe cyo kohereza: Mutarama-12-2024