I-Vacuum ion plating (i-ion plating ngamafuphi) ubuchwepheshe obusha bokwelapha obungaphezulu obuthuthukiswe ngokushesha ngeminyaka yawo-1970, olwahlongozwa ngu-DM Mattox we-Somdia Company e-United States ngo-1963. Kubhekiselwa kunqubo yokusebenzisa umthombo wokuhwamuka noma ithagethi yokufafaza ukuze kuhwamuke noma kufafaze izinto zefilimu ku-vacuum.
Eyokuqala iwukukhiqiza umhwamuko wensimbi ngokufudumeza nokuhwamuka kwempahla yefilimu, efakwe i-ionized ibe umhwamuko wensimbi kanye nama-athomu angathathi hlangothi angamandla aphezulu endaweni yokukhipha igesi ku-plasma, futhi ifinyelele ku-substrate ukwenza ifilimu ngokusebenzisa isenzo senkundla kagesi; eyokugcina isebenzisa ama-ion anamandla aphezulu (Isibonelo, i-Ar+) iqhumisa ibhomu ebusweni bento yefilimu ukuze izinhlayiya ezifafaziwe zenziwe i-ion noma ama-athomu angathathi hlangothi anamandla aphezulu esikhaleni sokuphuma kwegesi, futhi ibone ingaphezulu le-substrate ukuze yenze ifilimu.
Le ndatshana ishicilelwe nguGuangdong Zhenhua, umkhiqizi weimishini yokufaka i-vacuum
Isikhathi sokuthumela: Mar-10-2023