Vacuum ion plating (ion plating for short) bụ teknụzụ ọgwụgwọ elu ọhụrụ nke emepụtara ngwa ngwa na 1970, nke DM Mattox nke ụlọ ọrụ Somdia dị na United States tụpụtara na 1963. Ọ na-ezo aka na usoro nke iji isi iyi evaporation ma ọ bụ sputtering lekwasịrị anya iji kpochapụ ma ọ bụ gbasaa ihe nkiri ahụ na ikuku ikuku.
Nke mbụ bụ ịmepụta metal vepo site kpo oku na evaporating film ihe, nke a partially ionized n'ime metal vepo na elu-ike na-anọpụ iche atọm na gas ikwasa plasma ohere, na esịmde mkpụrụ na-etolite a film site edinam nke eletriki ubi; nke ikpeazụ na-eji ion dị elu ike (Dịka ọmụmaatụ, Ar +) bombards n'elu ihe nkiri ihe nkiri nke mere na sputtered ahụ na-ionized n'ime ion ma ọ bụ elu-ike na-anọpụ iche atọm site ohere nke gas ihapu, na-aghọta n'elu nke mkpụrụ na-etolite a film.
E bipụtara akụkọ a bụ Guangdong Zhenhua, onye na-emepụta iheakụrụngwa mkpuchi agụụ
Oge nzipu: Mar-10-2023