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Ion Beam Deposition Technology

Mohloli oa sengoloa: vacuum ea Zhenhua
Bala:10
E phatlalalitsoe:24-03-07

① Theknoloji ea ion e thusa ho kenya letsoho e tšoauoa ka ho khomarela ka matla pakeng tsa filimi le substrate, lera la filimi le matla haholo. Liteko li bontšitse hore: ion beam thusa deposition ea adhesion ho feta adhesion ea mouoane mouoane deposition e eketsehile ka makhetlo a 'maloa ho makhetlo a makholo, lebaka ke haholo-holo ka lebaka la ion bombardment ka holim'a phello ea tlhoekiso, e le hore lera botlaaseng segokanyimmediamentsi sa sebolokigolo ho theha gradient interfacial sebopeho, kapa lebasetere phetoho lera, hammoho le ho fokotsa khatello ea kelello lera.

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② Ion beam e thusa ho kenya letsoho ho ka ntlafatsa thepa ea mochini oa filimi, ho lelefatsa bophelo ba mokhathala, e loketseng haholo bakeng sa ho lokisoa ha li-oxide, li-carbides, li-cubic BN, TiB: le liaparo tse kang taemane. Ka mohlala, ka 1Crl8Ni9Ti tšepe manganga mocheso mabapi le tšebeliso ea ion beam-ba thusa deposition thekenoloji ho hōla 200nm SiN, tšesaane filimi, e seng feela ka thibela ho hlaha ha mapetsong mokhathala holim'a lintho tse bonahalang, empa hape ka haholo fokotsa mokhathala crack diffusion sekhahla, ho lelefatsa bophelo ba eona e na le karolo e ntle.

③ Ion beam e ka thusang ho kenya letsoho ho ka fetola mofuta oa khatello ea maikutlo ea filimi le sebopeho sa eona sa kristale. Ka mohlala, ho lokisoa ha filimi ea Cr e nang le 11.5keV Xe + kapa Ar + bombardment ea substrate surface, e fumane hore phetoho ea mocheso oa substrate, bombardment ion eneji, ion le athomo ea ho fihla ha karo-karolelano le likarolo tse ling, ho ka etsa hore khatello ea kelello e be khatello ea maikutlo ho tloha khatellong ea maikutlo ho ea ho khatello ea maikutlo, sebopeho sa kristale sa filimi le sona se tla hlahisa liphetoho. Tlas'a karo-karolelano e itseng ea li-ion ho liathomo, beam e thusang ion e na le chebahalo e ntle ho feta ea lera le behiloeng ke mouoane oa mocheso.

④ Beam e thusang ion e ka ntlafatsa khanyetso ea kutu le khanyetso ea oxidation ea membrane. Ha ion beam thusa deposition ea lera lera le le letso-letso, lera botlaaseng segokanyimmediamentsi sa sebolokigolo ntlafatsoa kapa sebopeho sa boemo amorphous bakoang ke ho nyamela ha moeli oa lijo-thollo pakeng tsa likaroloana, e leng e loketseng ho ho matlafatsa ho hanyetsa kutu le ho hanyetsa oxidation ea lintho tse bonahalang.

Ntlafatsa ho hanyetsa ha kutu ea thepa le ho hanela phello ea oxidizing ea mocheso o phahameng.

(5) Beam e thusang ion e ka fetola thepa ea motlakase ea filimi le ho ntlafatsa ts'ebetso ea lifilimi tse tšesaane tsa optical. (6) Tšebeliso e thusoang ke Ion e lumella ho hōla ha lifilimi tse fapaneng tse tšesaane ka mocheso o tlase le ho qoba liphello tse mpe ho lisebelisoa kapa likarolo tse nepahetseng tse ka bakoang ke phekolo ka mocheso o phahameng, kaha litekanyo tse amanang le ho kenngoa ha athomo le ho kenngoa ha ion li ka fetoloa ka nepo le ka boikemelo, 'me ho koaheloa ha li-micrometer tse' maloa tse nang le sebopeho se tsitsitseng ho ka hlahisoa ka matla a sa khaotseng.


Nako ea poso: Mar-07-2024