Tekinoroji yeKuisa Ion Beam

① Tekinoroji yeIon beam assisted deposition inoratidzwa nekunamatira kwakasimba pakati pefirimu ne substrate, firimu layer yakasimba kwazvo. Kuedza kwakaratidza kuti: ion beam assisted deposition of adhesion kupfuura adhesion ye thermal vapor deposition yakawedzera kakawanda kusvika kumazana, chikonzero chacho chinonyanya kukonzerwa ne ion bombardment pamusoro pe cleaning effect, kuitira kuti membrane base interface iumbe gradient interfacial structure, kana hybrid transition layer, pamwe nekuderedza kushushikana kwe membrane.

② Kuiswa kwesimbi yeIon kunogona kuvandudza hunhu hwemuchina hwefirimu, kuwedzera hupenyu hwekuneta, kwakakodzera kwazvo kugadzirira ma oxides, carbides, cubic BN, TiB: uye ma coatings akafanana nedhaimani. Semuenzaniso, mu1Crl8Ni9Ti simbi inodzivirira kupisa pakushandisa tekinoroji yeIon beam-assisted deposition kukura 200nm SiN, firimu rakatetepa, haringogone kudzikamisa kubuda kwekuputika kwekuneta pamusoro pechinhu, asiwo kunogona kuderedza zvakanyanya mwero wekupararira kwekuneta, kuwedzera hupenyu hwayo kune basa rakanaka.

③ Kuiswa kweIon beam assisted deposition kunogona kuchinja hunhu hwekumanikidzwa kwefirimu uye chimiro chayo chekristaro chinochinja. Semuenzaniso, kugadzirira Cr film ine 11.5keV Xe + kana Ar + bombardment ye substrate surface, kwakawana kuti kugadziriswa kwe substrate tembiricha, bombardment ion energy, ion uye atom arrival ratio nezvimwe parameters, zvinogona kuita kuti stress ibve pakumanikidzwa kuenda pakumanikidzwa, chimiro chekristaro chefirimu chichagadzirawo shanduko. Pasi peimwe ratio yemaion kumaatomu, ion beam assisted deposition ine sarudzo iri nani pane membrane layer yakaiswa ne thermal vapor deposition.

④ Kuiswa kwedanda reIon kunogona kuwedzera kuramba kwengura uye kuramba kuoxidation kwemembrane. Sezvo kuiswa kwedanda reIon kuoxidation kwedanda remembrane kwakasimba, kuvandudzwa kwechimiro che membrane base interface kana kuumbwa kwemamiriro asina chimiro kunokonzerwa nekunyangarika kwemuganhu wezviyo pakati pezvikamu, izvo zvinobatsira kuwedzera kuramba kuoxidation uye kuramba kuoxidation kwezvinhu.

Wedzera kuramba kwechinhu ichi kuti chisaparare uye kudzivirira kupisa kwakanyanya.

(5) Kuiswa kweIon beam assisted deposition kunogona kuchinja hunhu hweelectromagnetic hwefirimu uye kunatsiridza mashandiro emafirimu matete e optical. (6) Kuiswa kweIon-assisted deposition kunobvumira kukura kwemafirimu akasiyana-siyana matete patembiricha yakaderera uye kunodzivisa mhedzisiro yakaipa pazvinhu kana zvikamu zvakanyatsonaka zvingakonzerwa nekurapwa patembiricha yakakwirira, sezvo ma parameter ane chekuita neatomu deposition uye ion implantation anogona kugadziriswa nemazvo uye akazvimiririra, uye ma coatings ema micrometer mashoma ane composition yakafanana anogona kugadzirwa nguva dzose pamasimba mashoma ekubhomba.