Kuenzaniswa ne evaporation plating uye sputtering plating, chinonyanya kukosha cheion plating ndechekuti maion ane simba anobhomba substrate uye firimu layer apo deposition inoitika. Kubhomba kwemaion anochajiswa kunoburitsa zvakatevedzana, kunyanya sezvinotevera.
① Membrane / base bonding force (adhesion) yakasimba, iyo firimu layer haisi nyore kudonha nekuda kweion bombardment ye substrate inogadzirwa neiyo sputtering effect, kuitira kuti substrate icheneswe, ishandiswe uye inopisa, kwete kungobvisa adsorption yegasi pamusoro peiyo substrate uye iyo yakasvibiswa dhizaini, asi zvakare kubvisa iyo yakasvibiswa oxide. Ion bombardment yekupisa uye kukanganisa kunogona kukonzerwa nekuwedzerwa kupararira kwekuita kwe substrate, zvose kuvandudza crystalline zvimiro zve substrate pamusoro pedhizaini sangano, asi inopawo mamiriro ekuumbwa kwezvikamu zvealloy; uye yakakwira simba ion bombardment, asi zvakare inoburitsa imwe huwandu hweiyo ion kuisirwa uye ion beam kusanganisa maitiro.
② Ion yekuputira nekuda kwekugadzira yakanaka yekupfuura nemwaranzi kana yakakwira kudzvanywa (yakakura kupfuura kana kuenzana ne1Pa) ndeye ionized vapor ions kana mamorekuru murwendo rwayo kuenda kune substrate mamorekuru egasi asati asangana nekupokana kwakawanda, saka zvikamu zvemufirimu zvinogona kupararira zvakatenderedza substrate, nokudaro zvichivandudza kufukidzwa kwefirimu; uye iyo ionized film particles ichaiswawo pasi pechiito chemunda wemagetsi pamusoro pe substrate ine negative voltage Chero nzvimbo pamusoro pe substrate ine negative voltage, iyo isingagoni kuwanikwa ne evaporation plating.
-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua
Nguva yekutumira: Jan-12-2024