Xyoo 1963, lub tuam txhab Somdia DM Mattox tau tshaj tawm txog kev siv tshuab nqus tsev ion plating (ion plating) hauv Tebchaws Meskas, uas yog siv los kho cov khoom siv saum npoo av sai sai. Xyoo 1970, nws yog hais txog kev siv cov khoom siv evaporation los yog sputtering hauv huab cua nqus tsev kom cov khoom siv zaj duab xis evaporation los yog sputtering, evaporation los yog sputtering tawm ntawm ib feem ntawm cov khoom me me hauv qhov chaw tso pa roj ionized rau hauv cov hlau ions.
Cov khoom me me no tau muab tso rau ntawm lub substrate nyob rau hauv qhov kev ua ntawm lub zog hluav taws xob los tsim cov txheej txheem zaj duab xis nyias.
Muaj ntau hom kev siv lub tshuab nqus tsev ion plating, feem ntau yog raws li cov khoom siv membrane los tsim cov ion qhov chaw yuav muab faib ua ob hom: evaporation source type ion plating thiab sputtering target type ion plating. Thawj zaug yog evaporated los ntawm cua sov cov khoom siv zaj duab xis los tsim cov pa hlau, yog li nws yog ib feem ionized rau hauv cov pa hlau thiab cov atoms nruab nrab muaj zog siab hauv qhov chaw ntawm cov roj plasma tso tawm, los ntawm lub luag haujlwm ntawm lub teb hluav taws xob kom ncav cuag lub substrate los tsim cov zaj duab xis nyias; qhov kawg yog kev siv cov ions muaj zog siab (piv txwv li, Ar +) ntawm qhov chaw ntawm cov khoom siv zaj duab xis bombardment kom ua rau cov khoom me me sputtering los ntawm qhov chaw ntawm cov roj tso tawm ionized rau hauv ions lossis cov atoms nruab nrab muaj zog siab, kom ncav cuag qhov chaw ntawm lub substrate thiab tsim cov zaj duab xis.
– Tsab xov xwm no yog tso tawm los ntawmlub tshuab nqus tsev txheej tshuab chaw tsim khoomGuangdong Zhenhua
Lub sijhawm tshaj tawm: Lub Peb Hlis-07-2024