Uhi ʻIon Vacuum

ʻO ka uhi ʻana o ka ion vacuum (i kapa ʻia ʻo ka ion plating) i hāpai ʻia e ka hui ʻo Somdia ʻo DM Mattox i ʻAmelika Hui Pū ʻIa i ka makahiki 1963, ua hoʻomohala wikiwiki ʻia kahi ʻenehana lapaʻau ʻili hou i nā makahiki 1970. Pili ia i ka hoʻohana ʻana i ke kumu hoʻoheheʻe a i ʻole ka pahuhopu sputtering i loko o kahi lewa vacuum i mea e hoʻoheheʻe ai ka mea kiʻiʻoniʻoni a i ʻole sputtering, ea paha a i ʻole sputtering mai kahi ʻāpana o nā ʻāpana i loko o ka wahi hoʻokuʻu kinoea i ionized i nā ion metala.

Hoʻokomo ʻia kēia mau ʻāpana ma luna o ka substrate ma lalo o ka hana o ke kahua uila e hana i kahi kaʻina hana ʻoniʻoni lahilahi.

ʻO ke ʻano o ka hoʻopili ʻana i ka ion vacuum o nā ʻano he nui, maʻamau e like me ka mea membrane e hana ai i ke kumu ion e māhele ʻia i ʻelua ʻano: ke ʻano kumu evaporation ion plating a me ke ʻano target sputtering ion plating. Hoʻoheheʻe ʻia ka mea mua ma ka hoʻomehana ʻana i ka mea kiʻiʻoniʻoni e hana i nā mahu metala, i mea e ionized hapa ʻia ai i loko o nā mahu metala a me nā ʻātoma neutral ikehu kiʻekiʻe i loko o ka plasma hoʻokuʻu kinoea, ma o ke kuleana o ke kahua uila e hiki ai i ka substrate e hana i nā kiʻiʻoniʻoni lahilahi; ʻo ka mea hope loa ka hoʻohana ʻana i nā ion ikehu kiʻekiʻe (e laʻa, Ar +) ma luna o ka ʻili o ka mea kiʻiʻoniʻoni e hana i ka sputtering mai nā ʻāpana ma o ka hakahaka o ka hoʻokuʻu kinoea ionized i loko o nā ion a i ʻole nā ​​​​ʻātoma neutral ikehu kiʻekiʻe, e hiki ai i ka ʻili o ka substrate a hana i ke kiʻiʻoniʻoni.

–Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini uhi hakahakaGuangdong Zhenhua