(1) Igesi ekhipha amanzi. Igesi ekhipha amanzi kufanele ibe nezici zokukhiqiza amanzi amaningi, ingasebenzi kahle ezintweni eziqondiwe, ishibhile, kulula ukuyithola ihlanzekile kakhulu kanye nezinye izici. Ngokuvamile, i-argon iyigesi ekhipha amanzi efanelekile.
(2) I-voltage yokuphalaza kanye ne-voltage ye-substrate. Lawa mapharamitha amabili anomthelela obalulekile ezicini zefilimu, i-voltage yokuphalaza ayithinti nje kuphela izinga lokufakwa, kodwa futhi ithinta kakhulu isakhiwo sefilimu efakiwe. I-substrate potential ithinta ngqo ukugeleza kwe-electron noma i-ion komjovo womuntu. Uma i-substrate isekelwe, ihlaselwa ngama-electron alinganayo; uma i-substrate imisiwe, isendaweni yokukhipha ukukhanya ukuze ithole amandla amancane angemahle maqondana nomhlabathi we-suspension potential V1, kanye namandla e-plasma azungeze i-substrate V2 ukuthi abe phezulu kune-substrate potential, okuzobangela izinga elithile lokuphalaza kwama-electron nama-ion amahle, okuholela ekushintsheni kobukhulu befilimu, ukwakheka, kanye nezinye izici: uma i-substrate isebenzise ngamabomu i-voltage ye-bias, ukuze ihambisane ne-polarity yokwamukelwa kukagesi kwama-electron noma ama-ion, hhayi nje kuphela ukuthi ingahlanza i-substrate futhi ithuthukise ukunamathela kwefilimu, kodwa futhi ishintshe nesakhiwo sefilimu. Ekumbozweni kwe-radio frequency sputtering, ukulungiswa kwe-conductor membrane kanye ne-DC bias: ukulungiswa kwe-dielectric membrane kanye ne-tuning bias.
(3) Izinga lokushisa le-substrate. Izinga lokushisa le-substrate linomthelela omkhulu ekucindezelekeni kwangaphakathi kwefilimu, okubangelwa izinga lokushisa elithinta ngqo umsebenzi wama-athomu abekwe ku-substrate, ngaleyo ndlela kunqunywe ukwakheka kwefilimu, isakhiwo, usayizi wezinhlamvu ojwayelekile, ukuqondiswa kwekristalu kanye nokungapheleli.
–Lesi sihloko sikhishwe yi-umenzi womshini wokumboza nge-vacuumI-Guangdong Zhenhua
Isikhathi sokuthunyelwe: Jan-05-2024