(1) Igesi ekhupha amanzi. Igesi ekhupha amanzi kufuneka ibe neempawu zokutshiza okuphezulu, ingasebenzi kakuhle kwizinto ekujoliswe kuzo, ingabizi kakhulu, kulula ukuyifumana icocekile kakhulu kunye nezinye iimpawu. Ngokubanzi, i-argon yeyona gesi ifanelekileyo yokutshiza.
(2) I-voltage yokutshiza kunye ne-substrate voltage. Ezi parameter zimbini zinempembelelo ebalulekileyo kwiimpawu zefilimu, i-voltage yokutshiza ayichaphazeli nje kuphela izinga lokufakwa, kodwa ikwachaphazela kakhulu ulwakhiwo lwefilimu egciniweyo. I-substrate potential ichaphazela ngokuthe ngqo ukuhamba kwe-electron okanye i-ion yenaliti yomntu. Ukuba i-substrate isekelwe, ihlaselwa zii-electron ezilinganayo; ukuba i-substrate ixhonyiwe, ikwindawo yokukhupha ukukhanya ukuze ifumane amandla angalunganga kancinci malunga nomhlaba we-suspension potential V1, kwaye amandla e-plasma ejikeleze i-substrate V2 abe phezulu kune-substrate potential, eya kubangela inqanaba elithile lokutshiza ii-electron kunye nee-ions ezilungileyo, okubangela utshintsho kubukhulu befilimu, ukwakheka, kunye nezinye iimpawu: ukuba i-substrate isebenzise ngabom i-bias voltage, ukuze ihambelane ne-polarity yokwamkelwa kombane kwee-electron okanye ii-ions, ayinakucoca i-substrate kuphela kwaye iphucule ukunamathela kwefilimu, kodwa ikwatshintsha nolwakhiwo lwefilimu. Kwi-radio frequency sputtering coating, ukulungiswa kwe-conductor membrane kunye ne-DC bias: ukulungiswa kwe-dielectric membrane kunye ne-tuning bias.
(3) Ubushushu be-substrate. Ubushushu be-substrate bunempembelelo enkulu kuxinzelelo lwangaphakathi lwefilimu, olubangelwa bubushushu obuchaphazela ngokuthe ngqo umsebenzi wee-athomu ezifakwe kwi-substrate, ngaloo ndlela kumisela ukwakheka kwefilimu, ulwakhiwo, ubungakanani obuphakathi bengqolowa, ukujongwa kwekristale kunye nokungapheleli.
–Eli nqaku likhutshwe nguumenzi womatshini wokugquma nge-vacuumGuangdong Zhenhua
Ixesha leposi: Jan-05-2024