(1) Igesi efafazayo. Igesi yokuphalaza kufanele ibe nezici zokuvunwa okuphezulu kwe-sputtering, i-inert entweni ehlosiwe, eshibhile, kulula ukuyithola ukuhlanzeka okuphezulu nezinye izici. Ngokuvamile, i-argon iyigesi ekahle yokufafaza.
(2) I-sputtering voltage kanye ne-substrate voltage. Le mingcele emibili inomthelela obalulekile ezicini zefilimu, i-sputtering voltage ayithinti kuphela izinga lokubeka, kodwa futhi ithinta kakhulu isakhiwo sefilimu efakiwe. Amandla e-substrate athinta ngokuqondile ukugeleza kwe-electron noma ion komjovo womuntu. Uma i-substrate igxiliwe, ihlaselwa ngama-electron alinganayo; uma i-substrate imisiwe, isendaweni yokukhishwa okukhanyayo ukuze kutholwe amandla amancane angalungile ngokuphathelene nomhlabathi we-V1 engase ibe khona, futhi amandla e-plasma azungeze i-substrate V2 abe ngaphezu kwamandla e-substrate, okuzokwenza kube nezinga elithile lokuqhunyiswa kwama-electron nama-ion amahle, okuholela ekushintsheni kwezinye izici zefilimu, ukwakheka kwe-substrate, ukwakheka kwe-substrate. ihambisana ne-polarity yokwamukelwa kukagesi kwama-electron noma ama-ion, ayikwazi nje ukuhlanza i-substrate futhi ithuthukise ukunamathela kwefilimu, kodwa futhi iguqule isakhiwo sefilimu. Embotsheni yefrikhwensi yomsakazo, ukulungiswa kwe-conductor membrane kanye nokuchema kwe-DC: ukulungiswa kwe-dielectric membrane kanye nokuchema kokushuna.
(3) Izinga lokushisa elingaphansi. Ukushisa kwe-substrate kunomthelela omkhulu ekucindezelekeni kwangaphakathi kwefilimu, okubangelwa izinga lokushisa elithinta ngokuqondile umsebenzi wama-athomu afakwe ku-substrate, ngaleyo ndlela kunquma ukwakheka kwefilimu, isakhiwo, usayizi wokusanhlamvu omaphakathi, ukuqondiswa kwekristalu nokungapheleli.
-Le ndatshana ikhishwe nguumenzi womshini we-vacuum coatingI-Guangdong Zhenhua
Isikhathi sokuthumela: Jan-05-2024