(1) Ho fafatsa khase. Khase ea sputtering e lokela ho ba le litšobotsi tsa lihlahisoa tse phahameng tsa sputtering, inert ho thepa e reretsoeng, e theko e tlaase, e bonolo ho fumana bohloeki bo phahameng le litšobotsi tse ling. Ka kakaretso, argon ke khase e loketseng haholoanyane ea ho fafatsa.
(2) Matla a sputtering le substrate voltage. Mekhahlelo ena e 'meli e na le tšusumetso ea bohlokoa ho litšobotsi tsa filimi, sputtering voltage ha e ame feela sekhahla sa deposition, empa hape e ama ka ho teba sebopeho sa filimi e behiloeng. Matla a substrate a ama ka kotloloho phallo ea elektrone kapa ion ea ente ea motho. Haeba substrate e thehiloe fatše, e hlaseloa ke li-electrone tse lekanang; haeba substrate e emisitsoe, e sebakeng se khanyang ho fumana bokhoni bo fokolang bo amanang le mobu oa ho emisoa ha V1, le bokhoni ba plasma ho pota-potile V2 ea substrate e phahame ho feta bokhoni ba substrate, e leng se tla etsa hore ho be le tekanyo e itseng ea bombardment ea li-elektronike le li-ion tse ntle, e leng se fellang ka liphetoho ho litšoaneleho tse ling tsa filimi, sebopeho le sebopeho sa filimi. ke ho ea ka polarity ea kamohelo ea motlakase ea li-electrone kapa li-ion, eseng feela e ka hloekisang substrate le ho ntlafatsa ho khomarela filimi, empa hape e fetola sebopeho sa filimi. Sebokeng sa radio frequency sputtering, ho lokisoa ha membrane ea conductor hammoho le leeme la DC: ho lokisoa ha membrane ea dielectric hammoho le leeme la tokiso.
(3) Mocheso oa substrate. Mocheso oa substrate o na le tšusumetso e kholo khatellong ea ka hare ea filimi, e leng ka lebaka la mocheso o amang ka ho toba mosebetsi oa liathomo tse behiloeng holim'a substrate, ka hona ho khetholla sebopeho sa filimi, sebopeho, boholo ba lijo-thollo, mokhoa oa kristale le ho se fele.
-Sengoliloeng sena se lokolloa kemoetsi oa mochine oa vacuum coatingGuangdong Zhenhua
Nako ea poso: Jan-05-2024