1, Zvinoumba sputter unhani
Zvichienzaniswa nekushandisa kwakajairika kwevacuum evaporation, kushandisa sputtering kune zvinhu zvinotevera:
(1) Chero chinhu chinogona kusvirwa, kunyanya nzvimbo yakanyanya kunyunguduka, zvinhu zvine simba shoma uye zvinosanganiswa. Chero bedzi chiri chinhu chakasimba, chingave chiri simbi, semiconductor, insulator, compound uye musanganiswa, nezvimwewo, chingave chiri block, granular material inogona kushandiswa sechinhu chinonangwa. Sezvo kuora nekupatsanurwa kushoma kunoitika kana zvinhu zvinodzivirira kupisa uye alloys zvakaita se oxides zvichisvirwa, zvinogona kushandiswa kugadzira mafirimu matete uye alloy films ane zvikamu zvakafanana zvakafanana neizvo zvezvinhu zvinonangwa, uye kunyange mafirimu e superconducting ane compositions dzakaoma.' Pamusoro pezvo, nzira ye reactive sputtering inogona zvakare kushandiswa kugadzira mafirimu emakomichi akasiyana zvachose nezvinhu zvinonangwa, senge oxides, nitrides, carbides uye silicides.
(2) Kubatana kwakanaka pakati pefirimu rakapfapfaidzwa nesubstrate. Sezvo simba reatomu rakapfapfaidzwa riri pamusoro pe1-2 orders yehukuru kupfuura reatomu akapfapfaidzwa, kushandurwa kwesimba rezvikamu zvine simba rakawanda zvakaiswa pasubstrate kunogadzira simba rekupisa rakawanda, izvo zvinowedzera kunamira kwemaatomu akapfapfaidzwa kusubstrate. Chikamu chemaatomu akapfapfaidzwa ane simba rakawanda chichapinzwa kusvika padanho rakasiyana, zvichigadzira chinonzi pseudo-diffusion layer pasubstrate apo maatomu akapfapfaidzwa nemaatomu echinhu chesubstrate "zvinosanganiswa" pamwe chete. Pamusoro pezvo, panguva yekubhomba kwezvikamu zvinopfapfaidzwa, substrate inogara ichicheneswa uye ichishandiswa munzvimbo yeplasma, iyo inobvisa maatomu asina kunamira zvakanaka, inochenesa uye inomutsa pamusoro pesubstrate. Nekuda kweizvozvo, kunamira kwechikamu chefirimu chakapfapfaidzwa kusubstrate kunowedzera zvakanyanya.
(3) Kuwanda kwe sputter coating, ma pinholes mashoma, uye kuchena kwakanyanya kwe firimu layer nekuti hapana kusvibiswa kunokonzerwa ne crucible, izvo zvisingadzivisike mu vacuum vapor deposition panguva ye sputter coating process.
(4) Kugona kudzora uye kudzokorora kweukobvu hwefirimu. Sezvo simba rekuburitsa magetsi nerinotarirwa richigona kudzorwa zvakasiyana panguva yekuputira sputter, ukobvu hwefirimu hunogona kudzorwa nekudzora simba rekunotarirwa, nokudaro, kugona kudzora ukobvu hwefirimu uye kugona kudzokororwa kweukobvu hwefirimu nekuputira sputter kakawanda zvakanaka, uye firimu reukobvu hwakatarwa rinogona kuputirwa zvinobudirira. Pamusoro pezvo, sputter coating inogona kuwana ukobvu hwefirimu hwakafanana panzvimbo yakakura. Zvisinei, kune tekinoroji yekuputira sputter yakajairika (kunyanya dipole sputtering), michina yacho yakaoma uye inoda mudziyo wekumanikidza wakakwira; kumhanya kwekugadzirwa kwefirimu kwesputter deposition kwakaderera, chiyero chekuburitsa vacuum evaporation chiri 0.1 ~ 5nm/min, nepo chiyero chekuputira chiri 0.01 ~ 0.5nm/min; kukwira kwekushisa kwesubstrate kwakanyanya uye kuri panjodzi yekusvibiswa negasi, nezvimwewo. Zvisinei, nekuda kwekuvandudzwa kwetekinoroji yekuputira RF nemagnetron sputtering, kufambira mberi kukuru kwawanikwa mukuwana kukurumidza kuputira sputtering uye kuderedza tembiricha yesubstrate. Uyezve, mumakore achangopfuura, nzira itsva dzekuputira masputter dziri kuongororwa - zvichibva pa planar magnetron sputtering - kuderedza kumanikidzwa kwemhepo inoputira kusvika zero-pressure sputtering uko kumanikidzwa kwegasi rinopinda panguva yekuputira kuchava zero.
Nguva yekutumira: Mbudzi-08-2022