Ukadaulo wokutira sputtering

1, Mbali za sputter ❖ kuyanika
Poyerekeza ndi ❖ kuyanika kwa vacuum evaporation, ❖ kuyanika kwa sputtering kuli ndi zinthu izi:
(1) Chinthu chilichonse chingathe kusungunuka, makamaka malo osungunuka kwambiri, zinthu zotsika mtengo za nthunzi ndi zinthu zina. Malinga ngati ndi chinthu cholimba, kaya ndi chitsulo, semiconductor, insulator, compound ndi osakaniza, ndi zina zotero, kaya ndi block, zinthu zopangidwa ndi granular zingagwiritsidwe ntchito ngati chinthu chogwiritsidwa ntchito. Popeza kuwonongeka pang'ono ndi kugawa kumachitika pamene zinthu zotetezera kutentha ndi zinthu monga ma oxides zimasungunuka, zingagwiritsidwe ntchito pokonza mafilimu opyapyala ndi mafilimu a alloy okhala ndi zigawo zofanana ndi za chinthu chogwiritsidwa ntchito, komanso ngakhale mafilimu opangidwa ndi superconducting okhala ndi zinthu zovuta. Kuphatikiza apo, njira yogwiritsira ntchito reactive sputtering ingagwiritsidwenso ntchito popanga mafilimu a zinthu zosiyana kwambiri ndi zinthu zomwe zimagwiritsidwa ntchito, monga ma oxides, nitrides, carbides ndi silicides.
(2) Kugwirizana bwino pakati pa filimu yothira ndi substrate. Popeza mphamvu ya maatomu othira ndi yayikulu kwambiri kuposa maatomu othira, kusintha kwa mphamvu ya tinthu tamphamvu kwambiri tomwe timayikidwa pa substrate kumapanga mphamvu yotentha kwambiri, zomwe zimawonjezera kumamatira kwa maatomu othira ku substrate. Gawo la maatomu othira mphamvu zambiri lidzalowetsedwa m'madigiri osiyanasiyana, ndikupanga gawo lotchedwa pseudo-diffusion la substrate pomwe maatomu othira ndi maatomu a zinthu za substrate "zimasakanikirana" wina ndi mnzake. Kuphatikiza apo, panthawi ya kuphulika kwa tinthu tating'onoting'ono tothira, substrate nthawi zonse imatsukidwa ndikuyatsidwa mu plasma zone, zomwe zimachotsa maatomu osakhazikika bwino, zimayeretsa ndikuyambitsa pamwamba pa substrate. Zotsatira zake, kumamatira kwa filimu yothira ku substrate kumawonjezeka kwambiri.
(3) Kuchuluka kwa zokutira kwa sputter, mabowo ochepa, ndi kuyera kwakukulu kwa filimuyi chifukwa palibe kuipitsidwa komwe kungachitike, komwe sikungapeweke mu vacuum vapor vapor vapor panthawi yopangira sputter.
(4) Kuwongolera bwino komanso kubwerezabwereza kwa makulidwe a filimu. Popeza mphamvu yotulutsa ndi mphamvu yowunikira imatha kulamulidwa padera panthawi yopaka sputter, makulidwe a filimu amatha kulamulidwa powongolera mphamvu yowunikira, motero, kulamulira kwa makulidwe a filimu ndi kubwerezabwereza kwa makulidwe a filimu popaka sputter kangapo ndikwabwino, ndipo filimu yokhazikika ikhoza kuphimbidwa bwino. Kuphatikiza apo, sputter ikhoza kupeza makulidwe ofanana a filimu pamalo akulu. Komabe, paukadaulo wamba wopaka sputter (makamaka dipole sputtering), zidazo ndi zovuta ndipo zimafuna chipangizo champhamvu kwambiri; liwiro lopanga filimu yopaka sputter ndi lotsika, kuchuluka kwa mpweya wotuluka mu vacuum ndi 0.1 ~ 5nm/min, pomwe kuchuluka kwa sputtering ndi 0.01 ~ 0.5nm/min; kutentha kwa substrate kumakhala kokwera ndipo kumakhala kosavuta kugwidwa ndi mpweya wodetsedwa, ndi zina zotero. Komabe, chifukwa cha chitukuko cha RF sputtering ndi ukadaulo wopaka sputtering wa magnetron, kupita patsogolo kwakukulu kwapezeka pakukwaniritsa kuyika mwachangu kwa sputtering ndikuchepetsa kutentha kwa substrate. Komanso, m'zaka zaposachedwapa, njira zatsopano zokutira ma sputter zikufufuzidwa - kutengera planar magnetron sputtering - kuti achepetse kuthamanga kwa mpweya wothira mpaka zero-pressure sputtering pomwe kuthamanga kwa mpweya wolowa mkati panthawi yothira ma sputtering kudzakhala zero.