Metal organic chemical vapor deposition (MOCVD), kunobva gaseous zvinhu isimbi organic compound gasi, uye basic reaction process of deposition yakafanana neCVD.
1.MOCVD gasi mbishi
Iyo gaseous sosi inoshandiswa MOCVD isimbi-organic compound (MOC) gasi. Metal-organic compounds zvinhu zvakagadzikana zvinogadzirwa nekubatanidza organic zvinhu nesimbi. Organic makomisheni ane alkyl, anonhuwirira. Alkyl inosanganisira methyl, ethyl, propyl, uye butyl. Alkyl inosanganisira methyl, ethyl, propyl, uye butyl. Inonhuhwirira inosanganisira phenyl homologues, trimethyl gallium, [Ga(CH3)3], trimethyl aluminium [Al(CH3)3] yekuiswa kweiyo microelectronics, optoelectronics, semiconductors muzvikamu zvitatu, zvishanu muchikamu chefirimu, seGa(CH)3)3 uye ammonia inogona kunge iri musilicon wafer kana safiri pane epitaxial kukura kwemarambi e LED muInGaN luminescent layer. Mwenje ye LED inopfuura tungsten incandescent simba-inoponesa 90%, inopfuura 60% inochengetedza magetsi efluorescent. Marambi e LED ane 90% ane simba rakawanda pane mwenje wetungsten incandescent uye 60% mamwe emagetsi anoshanda kupfuura mwenje wefluorescent. Mazuvano, marudzi ese emarambi emumugwagwa, marambi emwenje uye marambi emotokari anonyanya kushandisa ma LED emwenje-emitting mafirimu anogadzirwa neMOCVD.
2. Deposition tembiricha
Tembiricha yekuparara kweorganic metal compounds yakadzikira, uye tembiricha yekuisa yakaderera pane yeHCVD. Iyo tembiricha yekuisa yeTiN yakaiswa neMOCVD inogona kudzikiswa kusvika pa500 degree.
-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua
Nguva yekutumira: Oct-20-2023