1. Kuisa maion beam assisted deposition kunonyanya kushandisa maion beams ane simba shoma kubatsira pakugadzirisa zvinhu pamusoro.
(1) Hunhu hwekushandiswa kwemaion anobatsira kuisa
Munguva yekuputira, zvidimbu zvefirimu zvakachengetwa zvinoramba zvichiputirwa nemaion ane chaji kubva kunobva maion pamusoro pe substrate uku zvichiputirwa nematanda emaion ane chaji.
(2) Basa rekubatsira kuisa ma ion
Maion ane simba rakawanda anoputira zvidimbu zvefirimu zvakasungwa zvisina kusimba chero nguva; Nekutamisa simba, zvidimbu zvakachengetwa zvinowana simba guru rekinetic, nokudaro zvichivandudza mutemo we nucleation nekukura; Zvinogadzira simba rekumanikidzana pa membrane tissue chero nguva, zvichiita kuti firimu ikure zvakanyanya; Kana maion egasi anopindura akapinzwa, stoichiometric compound layer inogona kuumbwa pamusoro pechinhu chacho, uye hapana chinopindirana pakati pe compound layer ne substrate.
2. Sosi yeIon yekuisa danda reIon nerubatsiro
Hunhu hwekushandiswa kweioni beam assisted deposition ndehwekuti maatomu efirimu layer (deposition particles) anogara achiputirwa nemaion ane simba shoma kubva kuioni source pamusoro pe substrate, zvichiita kuti chimiro chefirimu chive chakaoma uye zvichivandudza mashandiro efirimu layer. Simba E reion beam i ≤ 500eV. Ma ion source anoshandiswa kazhinji anosanganisira: Kauffman ion source, Hall ion source, anode layer ion source, hollow cathode Hall ion source, radio frequency ion source, nezvimwewo.
Nguva yekutumira: Chikumi-30-2023

