Kupopota kwemagnetron kunoreva kuti gasi rinoita basa rinopihwa kuti riite basa nemasputtered particles panguva yekupopota kuti rigadzire compound film. Rinogona kupa reactive gas kuti riite basa nemasputtered compound target panguva imwe chete, uye rinogonawo kupa reactive gas kuti riite basa nemasputtered metal kana alloy target panguva imwe chete kuti rigadzirire compound film ine chemical ratio yakapihwa. Hunhu hwe reactive magnetron sputtering kugadzira compound films ndeidzi:
(1) Zvinhu zvinoshandiswa pakupinza magnetron (single element target kana multi-element target) uye magasi ekuita zviri nyore kuwana kuchena kwakanyanya, izvo zvinobatsira pakugadzirira mafirimu ecompound ane kuchena kwakanyanya.
(2) Mukugadzirisa magnetron, nekugadzirisa maparamita ekugadzirisa, chiyero chemakemikari kana chiyero chisiri chemakemikari chemafirimu akasanganiswa chinogona kugadzirwa, kuitira kuti chinangwa chekudzora hunhu hwefirimu nekugadzirisa chimiro chefirimu chibudirire.
(3) Tembiricha ye substrate kazhinji haisi yakanyanya kukwira panguva yekuiswa kwe reactive magnetron sputtering, uye maitiro ekugadzira firimu kazhinji haadi kuti substrate ipiswe kusvika pakupisa kwakanyanya, saka pane zvirambidzo zvishoma pane zvinhu zve substrate.
(4) Kusputtering kwemagnetron kunoshanda kwakakodzera kugadzirira mafirimu matete akaenzana munzvimbo yakakura, uye kunogona kuita kuti kugadzirwa kwemaindasitiri kuve nekugadzirwa kwegore negore kwemamiriyoni emamita epurasitiki kubva pamuchina mumwe chete. Kazhinji, hunhu hwefirimu hunogona kuchinjwa nekungochinja chiyero chegasi rinoita basa kune gasi risina simba panguva yekusputtering. Semuenzaniso, firimu rinogona kuchinjwa kubva pasimbi kuenda kune semiconductor kana kuti kwete-simbi.
——Chinyorwa chino chinemugadziri wemuchina wevacuum coatingGuangdong Zhenhua yakaburitswa
Nguva yekutumira: Nyamavhuvhu-31-2023