Reactive magnetron sputtering zvinoreva kuti reactive gasi rinopihwa kuti riite ne sputtered particles mukuita sputtering kugadzira firimu remusanganiswa. Inogona kugovera reactive gasi kuti iite pamwe chete ne sputtering compound target panguva imwe chete, uye inogonawo kupa reactive gasi kuti iite ne sputtering simbi kana alloy target panguva imwe chete kugadzirira firimu rekomboni rine chiyero chemakemikari akapiwa.
(1) Izvo zvinonangwa zvishandiswa zvinoshandiswa reactive magnetron sputtering (chimwe chinhu chinonangwa kana akawanda-element chinongedzo) uye magasi ekuita ari nyore kuwana kuchena kwepamusoro, izvo zvinokonzeresa kugadzirira kwepamusoro-kuchena kombindi mafirimu.
(2) Mune reactive magnetron sputtering, nekugadzirisa iyo deposition process parameters, kemikari reshiyo kana isiri-kemikari reshiyo yemafirimu akakoniwa inogona kugadzirwa, kuitira kuzadzisa chinangwa chekudzora maitiro emufirimu nekugadzirisa kuumbwa kwefirimu.
(3) Tembiricha yeiyo substrate kazhinji haina kunyanya kukwira panguva yeiyo reactive magnetron sputtering deposition process, uye iyo firimu kuumba maitiro kazhinji haidi kuti substrate ipiswe kune yakanyanya kupisa tembiricha, saka pane zvishoma zvinorambidzwa pane substrate zvinhu.
(4) Reactive magnetron sputtering inokodzera kugadzirira kwemafirimu akakura-nzvimbo homogeneous matete, uye anogona kuwana kugadzirwa kwemaindasitiri nekubuda kwepagore kwemiriyoni yemamita emamita ekuputira kubva kumuchina mumwe chete. Muzviitiko zvakawanda, chimiro chefirimu chinogona kuchinjwa nekungoshandura chiyero chegasi rinoshanda kune gasi inert panguva yekuputika. Semuenzaniso, iyo firimu inogona kuchinjwa kubva kusimbi kusvika kune semiconductor kana isiri-simbi.
——Chinyorwa chinovacuum coating machine mugadziriGuangdong Zhenhua yakaburitswa
Nguva yekutumira: Aug-31-2023