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Introduction of vacuum vapor deposition, sputtering and ion coating

Article source:Zhenhua vacuum
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Published:22-11-07

Vacuum coating mainly includes vacuum vapor deposition, sputtering coating and ion coating, all of which are used to deposit various metal and non-metal films on the surface of plastic parts by distillation or sputtering under vacuum conditions, which can obtain a very thin surface coating with the outstanding advantage of fast adhesion, but the price is also higher, and the types of metals that can be operated are less, and are generally used for functional coating of higher-grade products.
Introduction of vacuum vapor deposition, sputtering and i
Vacuum vapor deposition is a method of heating the metal under high vacuum, making it melt, evaporate, and form a thin metal film on the surface of the sample after cooling, with a thickness of 0.8-1.2 um. It fills in the small concave and convex parts on the surface of the formed product to obtain a mirror-like surface.When vacuum vapor deposition is performed either to obtain a reflective mirror effect or to vacuum vaporize a steel with low adhesion, the bottom surface must be coated.

Sputtering usually refers to magnetron sputtering, which is a high-speed low-temperature sputtering method. The process requires a vacuum of about 1×10-3Torr, that is 1.3×10-3Pa vacuum state filled with inert gas argon (Ar), and between the plastic substrate (anode) and the metal target (cathode) plus high-voltage direct current, due to the electron excitation of inert gas generated by glow discharge, producing plasma, the plasma will blast out the atoms of the metal target and deposits them on the plastic substrate. Most of the general metal coatings use DC sputtering, while the non-conductive ceramic materials use RF AC sputtering.

Ion coating is a method in which a gas discharge is used to partially ionize the gas or the evaporated substance under vacuum conditions, and the evaporated substance or its reactants are deposited on the substrate by bombardment of gas ions or ions of the evaporated substance. These include magnetron sputtering ion coating, reactive ion coating, hollow cathode discharge ion coating (hollow cathode vapor deposition method), and multi-arc ion coating (cathode arc ion coating).

Vertical double-sided magnetron sputtering continuous coating in line
Wide applicability, can be used for electronic products such as notebook shell EMI shielding layer, flat products, and even all lamp cup products within a certain height specification can be produced. Large loading capacity, compact clamping and staggered clamping of conical light cups for double-sided coating, which can have larger loading capacity. Stable quality, good consistency of film layer from batch to batch. High degree of automation and low running labor cost.


Post time: Nov-07-2022