Gabatarwar ajiyar tururin injin, sputtering da kuma murfin ion

Rufin injin tsabtace iska ya ƙunshi ajiyar tururin iska, rufewar sputtering da kuma rufewar ion, waɗanda duk ana amfani da su don sanya nau'ikan fim ɗin ƙarfe da na ƙarfe daban-daban a saman sassan filastik ta hanyar distillation ko sputtering a ƙarƙashin yanayin injin tsabtace iska, wanda zai iya samun rufin saman siriri tare da babban fa'idar mannewa cikin sauri, amma farashin kuma ya fi girma, kuma nau'ikan ƙarfe da za a iya sarrafawa ba su da yawa, kuma galibi ana amfani da su don rufewa mai aiki na samfuran inganci.
Tacewar tururin injin tsotsar ruwa hanya ce ta dumama ƙarfen a ƙarƙashin babban injin tsotsar ruwa, wanda ke sa ya narke, ya ƙafe, sannan ya samar da siririn fim ɗin ƙarfe a saman samfurin bayan ya sanyaya, tare da kauri na 0.8-1.2 um. Yana cike ƙananan sassan da ke da siffar ƙololuwa da kuma masu siffar ƙololuwa a saman samfurin da aka samar don samun saman da ke kama da madubi. Lokacin da aka yi tatsar tururin injin tsotsar ruwa ko dai don samun tasirin madubi mai haske ko kuma don yin tatsar ƙarfe mai ƙarancin mannewa, dole ne a shafa saman ƙasan.

Sputtering yawanci yana nufin magnetron sputtering, wanda hanya ce ta sputtering mai saurin sauri a yanayin zafi. Tsarin yana buƙatar injin tsabtace iska mai kimanin 1 × 10-3Torr, wato yanayin injin tsabtace iska mai inert argon (Ar), kuma tsakanin filastik substrate (anode) da ƙarfe mai manufa (cathode) tare da babban ƙarfin lantarki kai tsaye, saboda haɓakar electron na iskar gas mai inert da aka samar ta hanyar fitar da haske, wanda ke samar da plasma, plasma zai fitar da ƙwayoyin ƙarfe na abin da aka makala kuma ya sanya su a kan filastik ɗin. Yawancin rufin ƙarfe na yau da kullun suna amfani da DC sputtering, yayin da kayan yumbu marasa sarrafawa suna amfani da RF AC sputtering.

Rufin ion wata hanya ce da ake amfani da fitar iskar gas don rage iskar gas ko sinadarin da aka fitar a cikin iskar a ƙarƙashin yanayin injin, kuma ana ajiye sinadarin da aka fitar ko kuma abubuwan da ke haifar da shi a kan substrate ta hanyar jefa ions na iskar gas ko ions na sinadarin da aka fitar. Waɗannan sun haɗa da murfin ion na magnetron sputtering, murfin ion mai amsawa, murfin ion na fitar da iskar cathode (hanyar adana tururin cathode mai rami), da kuma murfin ion mai yawa (rufin ion na cathode arc).

Tsaye mai gefe biyu mai gefe mai siffar magnetron sputtering mai ci gaba a layi
Ana iya amfani da shi sosai don samfuran lantarki kamar su layin kariyar EMI na harsashi na littafin rubutu, samfuran lebur, har ma da duk samfuran kofin fitila a cikin takamaiman tsayi ana iya samar da su. Ana iya samar da babban ƙarfin lodi, ƙaramin mannewa da matsewa mai tsayi na kofunan haske masu siffar mazugi don rufewa mai gefe biyu, wanda zai iya samun babban ƙarfin lodi. Inganci mai karko, kyakkyawan daidaito na layin fim daga tsari zuwa tsari. Babban matakin sarrafa kansa da ƙarancin farashin aiki.

– An fitar da wannan labarin ne dagainjin shafa injin injinGuangdong Zhenhua